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可设计的硅化物纳米线弹簧的集成作为超紧凑和可拉伸的电子互连。

Designable Integration of Silicide Nanowire Springs as Ultra-Compact and Stretchable Electronic Interconnections.

机构信息

National Laboratory of Solid State Microstructures, School of Electronic Science and Engineering, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, P. R. China.

出版信息

Small. 2022 Feb;18(6):e2104690. doi: 10.1002/smll.202104690. Epub 2021 Dec 2.

Abstract

Stretchable electronics are finding widespread applications in bio-sensing, skin-mimetic electronics, and flexible displays, where high-density integration of elastic and durable interconnections is a key capability. Instead of forming a randomly crossed nanowire (NW) network, here, a large-scale and precise integration of highly conductive nickel silicide nanospring (SiNi -NS) arrays are demonstrated, which are fabricated out of an in-plane solid-liquid-solid guided growth of planar Si nanowires (SiNWs), and subsequent alloy-forming process that boosts the channel conductivity over 4 orders of magnitude (to 2 × 10 S cm ). Thanks to the narrow diameter of the serpentine SiNi -NS channels, the elastic geometry engineering can be accomplished within a very short interconnection distance (down to ≈3 µm), which is crucial for integrating high-density displays or logic units in a rigid-island and elastic-interconnection configuration. Deployed over soft polydimethylsiloxane thin film substrate, the SiNi -NS array demonstrates an excellent stretchability that can sustain up to 50% stretching and for 10 000 cycles (at 15%). This approach paves the way to integrate high-density inorganic electronics and interconnections for high-performance health monitoring, displays, and on-skin electronic applications, based on the mature and rather reliable Si thin film technology.

摘要

可拉伸电子产品在生物传感、仿皮肤电子和柔性显示器等领域得到了广泛的应用,在这些领域中,高密度集成弹性和耐用的互连是一项关键能力。在这里,我们展示了大规模和精确集成的高导电性镍硅化物纳米弹簧(SiNi -NS)阵列,而不是形成随机交叉的纳米线(NW)网络。这些纳米弹簧阵列是通过平面内固-液-固引导生长的平面硅纳米线(SiNW)和随后的合金形成工艺制造的,这一工艺将沟道电导率提高了 4 个数量级(达到 2×10 S cm )。由于蛇形 SiNi -NS 通道的直径很窄,弹性几何工程可以在非常短的互连距离内(低至≈3 μm)完成,这对于在刚性岛和弹性互连配置中集成高密度显示器或逻辑单元至关重要。该 SiNi -NS 阵列在柔软的聚二甲基硅氧烷薄膜衬底上表现出出色的可拉伸性,可承受高达 50%的拉伸和 10000 次循环(在 15%应变下)。这种方法为基于成熟且相当可靠的硅薄膜技术的高性能健康监测、显示器和皮肤电子应用集成高密度无机电子和互连铺平了道路。

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