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(Tm + Ta)共掺杂TiO陶瓷中的巨介电响应和弛豫行为

Giant dielectric response and relaxation behavior in (Tm + Ta) co-doped TiO ceramics.

作者信息

Fan Jiangtao, Chen Yimeng, Long Zhen, Tong Liping, He Gang, Hu Zhanggui

机构信息

Tianjin Key Laboratory of Functional Crystal Materials, Institute of Functional Crystal, College of Material Sciene and Engineering, Tianjin University of Technology, Tianjin 300384, China.

出版信息

Phys Chem Chem Phys. 2022 Feb 23;24(8):4759-4768. doi: 10.1039/d1cp05348e.

Abstract

Dielectric materials with huge dielectric constants are attracting attention due to the growing demand for microelectronics and high energy-storage devices. In this work, Tm + Ta co-doped TiO ceramics were prepared by a solid-state reaction (SSR) method, and the microstructure and dielectric behavior were investigated. A ultrahigh permittivity ( ∼ 2.26 × 10) and very low loss (tan  ∼ 0.011) are achieved at 1 kHz for (TmTa)TiO ceramics. XPS analysis confirms that the high dielectric constant and low dielectric loss are attributed to the electron pinned defect dipole (EPDD) response formed by the coupling of Ti and oxygen vacancies. In addition, impedance analysis and frequency dependent dielectric constant under a DC bias indicate that the presence of the internal barrier layer capacitance (IBLC) response and electrode response at low to medium frequencies (<10 Hz) also contribute significantly to the dielectric constant. The findings reported in this work provide valuable insights into the simultaneous realization of a low dielectric loss and high permittivity in Tm + Ta co-doped TiO ceramics and other related dielectric ceramics.

摘要

由于对微电子和高储能器件的需求不断增长,具有巨大介电常数的介电材料正受到关注。在这项工作中,采用固态反应(SSR)法制备了Tm+Ta共掺杂的TiO陶瓷,并对其微观结构和介电行为进行了研究。对于(TmTa)TiO陶瓷,在1 kHz时实现了超高介电常数(约2.26×10)和极低损耗(tanδ约0.011)。XPS分析证实,高介电常数和低介电损耗归因于Ti和氧空位耦合形成的电子钉扎缺陷偶极子(EPDD)响应。此外,阻抗分析和直流偏压下的频率相关介电常数表明,低至中频(<10 Hz)下内部势垒层电容(IBLC)响应和电极响应的存在也对介电常数有显著贡献。这项工作中报道的研究结果为在Tm+Ta共掺杂的TiO陶瓷和其他相关介电陶瓷中同时实现低介电损耗和高介电常数提供了有价值的见解。

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