Santos Silva Gabriel, Maj Lukasz, Morgiel Jerzy, Vieira Maria Teresa, Ramos Ana Sofia
University of Coimbra, CEMMPRE, Department of Mechanical Engineering, Polo II, R. Luís Reis Santos, 3030-788 Coimbra, Portugal.
Poland Institute of Metallurgy and Materials Science, Polish Academy of Sciences, Reymonta 25, 30-059 Krakow, Poland.
Materials (Basel). 2022 Jan 24;15(3):869. doi: 10.3390/ma15030869.
The aim of this research work was to optimize the coating of tungsten wires with reactive multilayer thin films and promote an exothermic self-propagating reaction. The ultimate goal is to use this heat to liquify low melting temperature materials, and thus block crack propagation in metallic materials. Ni/Me (Me = Al, Ti) multilayers were deposited by a DC (direct current) magnetron sputtering onto tungsten wires with diameters of 0.05 and 0.20 mm. The depositions were carried out to obtain films with near equiatomic average chemical composition and a modulation period (bilayer thickness) between 20 and 50 nm. The cross-section of the films was analyzed using electron microscopy before and after electrical ignition. A new substrate holder was developed to improve the quality of the Al/Ni films, allowing a reduction in the defects previously observed. The Ni/Ti thin films showed no discernible defects, regardless of the substrate holder. However, after ignition, the Ni + Ti reaction occurred in a non-self-propagating mode. Passing an electric current through a wire (ϕ = 0.05 mm) coated with an Al/Ni thin film, promoted a flash of light that was associated with the start of a self-propagating reaction. The reaction product was a B2-AlNi intermetallic phase. W wires coated with reactive multilayers may contribute to crack filling, and have potential to be self-healing actuators.
本研究工作的目的是优化用反应性多层薄膜对钨丝进行的涂层处理,并促进放热自蔓延反应。最终目标是利用这种热量使低熔点材料液化,从而阻止金属材料中的裂纹扩展。通过直流磁控溅射将Ni/Me(Me = Al、Ti)多层膜沉积到直径为0.05和0.20 mm的钨丝上。进行沉积以获得具有近等原子平均化学成分且调制周期(双层厚度)在20至50 nm之间的薄膜。在电点火前后,使用电子显微镜对薄膜的横截面进行分析。开发了一种新的衬底支架以提高Al/Ni薄膜的质量,减少了先前观察到的缺陷。无论衬底支架如何,Ni/Ti薄膜均未显示出明显的缺陷。然而,点火后,Ni + Ti反应以非自蔓延模式发生。通过一根涂有Al/Ni薄膜的导线(ϕ = 0.05 mm)通电,会引发一道闪光,这与自蔓延反应的开始有关。反应产物是一种B2-AlNi金属间相。涂有反应性多层膜的钨丝可能有助于裂纹填充,并有潜力成为自修复致动器。