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刻划光栅的误差分析与光栅刻划机的机构优化

Error analysis of a ruled grating and mechanism optimization of a grating ruling machine.

作者信息

Yang Chao, Guo Jie, Yue Liu

出版信息

Appl Opt. 2022 Jan 1;61(1):91-100. doi: 10.1364/AO.444034.

Abstract

To improve the quality and success rate of grating ruling, we theoretically analyze the factors that affect the grating performance according to the Fraunhofer far-field diffraction method. The analysis shows that the yaw angle error of the grating line has a greater impact on the performance index. Based on this result, we simulate and analyze the angle error by the principle of mechanical simulation. Then we determine the thickness of the spring sheet, the number of connecting steel sheets, and the initial closing force of the tension spring. We use the optimized workbench structure of the grating ruling machine to rule three gratings. The diffracted wavefronts are all better than /3, and the success rate is 100%, which means that the experiments verify the effectiveness of the modified workbench structure.

摘要

为提高光栅刻划的质量和成功率,我们根据夫琅禾费远场衍射法从理论上分析了影响光栅性能的因素。分析表明,光栅刻线的偏航角误差对性能指标有较大影响。基于此结果,我们通过机械仿真原理对角度误差进行了模拟分析。然后确定了弹簧片的厚度、连接钢板的数量以及拉伸弹簧的初始闭合力。我们使用光栅刻划机优化后的工作台结构刻划了三块光栅。衍射波前均优于λ/3,成功率为100%,这表明实验验证了改进后工作台结构的有效性。

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