Vohánka Jiří, Ohlídal Ivan, Buršíková Vilma, Klapetek Petr, Kaur Nupinder Jeet
Opt Express. 2022 Jan 17;30(2):2033-2047. doi: 10.1364/OE.447146.
An inhomogeneous polymer-like thin film was deposited by the plasma enhanced chemical vapor deposition onto silicon single-crystal substrate whose surface was roughened by anodic oxidation. The inhomogeneous thin film with randomly rough boundaries was created as a result. This sample was studied using the variable-angle spectroscopic ellipsometry and spectroscopic reflectometry. The structural model including the inhomogeneous thin film, transition layer, and identically rough boundaries was used to process the experimental data. The scalar diffraction theory was used to describe the influence of roughness. The influence of the scattered light registered by the spectrophotometer due to its finite acceptance angle was also taken into account. The thicknesses and optical constants of the inhomogeneous thin film and the transition layer were determined in the optical characterization together with the roughness parameters. The determined rms value of the heights of roughness was found to be in good agreement with values obtained using AFM. The results of the optical characterization of the studied inhomogeneous thin film with rough boundaries were also verified by comparing them with the results of the optical characterization of the inhomogeneous thin film prepared using the same deposition conditions but onto the substrate with a smooth surface.
通过等离子体增强化学气相沉积法，在经阳极氧化使其表面粗糙化的硅单晶衬底上沉积了一种非均匀的聚合物状薄膜。结果形成了具有随机粗糙边界的非均匀薄膜。使用可变角度光谱椭偏仪和光谱反射仪对该样品进行了研究。采用包括非均匀薄膜、过渡层和相同粗糙边界的结构模型来处理实验数据。用标量衍射理论描述粗糙度的影响。还考虑了由于分光光度计有限的接收角而记录的散射光的影响。在光学表征中确定了非均匀薄膜和过渡层的厚度、光学常数以及粗糙度参数。发现所确定的粗糙度高度的均方根值与使用原子力显微镜获得的值吻合良好。通过将具有粗糙边界的所研究非均匀薄膜的光学表征结果与在相同沉积条件下但沉积在表面光滑的衬底上制备的非均匀薄膜的光学表征结果进行比较，也验证了这些结果。
