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利用高谐波源的实验室规模叠层成像技术进展[特邀报告]

Advances in laboratory-scale ptychography using high harmonic sources [Invited].

作者信息

Loetgering Lars, Witte Stefan, Rothhardt Jan

出版信息

Opt Express. 2022 Jan 31;30(3):4133-4164. doi: 10.1364/OE.443622.

Abstract

Extreme ultraviolet microscopy and wavefront sensing are key elements for next-generation ultrafast applications, such as chemically-resolved imaging, focal spot diagnostics in pump-and-probe experiments, and actinic metrology for the state-of-the-art lithography node at 13.5 nm wavelength. Ptychography offers a robust solution to the aforementioned challenges. Originally adapted by the electron and synchrotron communities, advances in the stability and brightness of high-harmonic tabletop sources have enabled the transfer of ptychography to the laboratory. This review covers the state of the art in tabletop ptychography with high harmonic generation sources. We consider hardware options such as illumination optics and detector concepts as well as algorithmic aspects in the analysis of multispectral ptychography data. Finally, we review technological application cases such as multispectral wavefront sensing, attosecond pulse characterization, and depth-resolved imaging.

摘要

极紫外显微镜和波前传感是下一代超快应用的关键要素,如化学分辨成像、泵浦-探测实验中的焦斑诊断以及用于13.5纳米波长的先进光刻节点的光化学计量学。叠层成像术为上述挑战提供了一种可靠的解决方案。最初由电子和同步加速器领域采用,高谐波桌面光源在稳定性和亮度方面的进展使得叠层成像术能够转移到实验室。本综述涵盖了使用高谐波产生光源的桌面叠层成像术的现状。我们考虑了诸如照明光学器件和探测器概念等硬件选项,以及多光谱叠层成像术数据分析中的算法方面。最后,我们回顾了多光谱波前传感、阿秒脉冲表征和深度分辨成像等技术应用案例。

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