J Adhes Dent. 2022 Mar 1;24:39-48. doi: 10.3290/j.jad.b2701695.
To experimentally assess the effect of regenerative heat treatment (HT) on yttria-stabilized tetragonal zirconia polycrystalline ceramic (Y-TZP) to guarantee veneer adhesion strength.
One surface of bar-shaped Y-TZP specimens was ground (G) with a diamond stone, while the control samples (C) were not. Groups C900 and G900 were submitted to HT at 900°C for 60 min, whereas groups C1000 and G1000 were submitted to HT at 1000°C for 30 min. The treated surfaces were characterized by x-ray diffractometry (XRD), scanning electron microscopy (SEM), and optical and mechanical profilometry. The energy release rate through interface fracture was determined by a four-point bending test on notched Y-TZP veneered specimens. XRD was refined by the Rietveld method, mean roughness (Ra) and energy release rate were submitted to two-way ANOVA (a = 0.05), and the images were analyzed descriptively.
The monoclinic phase (vol%), means of Ra (µm), and the energy release rate (J/m2) were, respectively: C = 1.2/0.17/6.8, C900 = 0.0/0.18/6.6, C1000 = 0.0/0.18/7.6, G = 2.6/1.16/8.3, G900 = 0.0/1.07/8.0, and G1000 = 0.0/1.01/5.7. The surface fraction of monoclinic zirconia increased by grinding and decreased by HT. Ra also increased after grinding (p < 0.005) but remained unaltered after HT (p = 0.22). Increased irregularity was observed in the G groups and a subtle smoothing of the surface after HT. After the fracture of the bilayers, a residual amount of porcelain could be seen on the zirconia surface in all groups. The energy release rate was statistically equal among all groups (p > 0.05).
Heat treatment after grinding completely restored the tetragonal phase of zirconia without altering the energy release rate during interfacial fracture.
通过实验评估再生热处理（HT）对氧化钇稳定四方氧化锆多晶陶瓷（Y-TZP）的影响，以保证贴面粘结强度。
棒状 Y-TZP 试件的一个表面用金刚石研磨（G），而对照组（C）试件不进行研磨。C900 和 G900 两组在 900°C 下进行 HT60min，而 C1000 和 G1000 两组在 1000°C 下进行 HT30min。用 X 射线衍射仪（XRD）、扫描电子显微镜（SEM）、光学和机械轮廓仪对处理后的表面进行了表征。通过对带缺口 Y-TZP 贴面试件进行四点弯曲试验，测定界面断裂的能量释放率。XRD 通过 Rietveld 法进行细化，平均粗糙度（Ra）和能量释放率进行双因素方差分析（a = 0.05），图像进行描述性分析。
单斜相（体积%）、Ra（µm）均值和能量释放率（J/m2）分别为：C = 1.2/0.17/6.8，C900 = 0.0/0.18/6.6，C1000 = 0.0/0.18/7.6，G = 2.6/1.16/8.3，G900 = 0.0/1.07/8.0，G1000 = 0.0/1.01/5.7。研磨后单斜氧化锆的表面分数增加，HT 后减少。研磨后 Ra 增加（p < 0.005），但 HT 后不变（p = 0.22）。G 组表面粗糙度增加，HT 后表面略有平滑。在双层断裂后，所有组的氧化锆表面都可以看到残留的瓷量。各组之间的能量释放率无统计学差异（p > 0.05）。
研磨后进行热处理可完全恢复氧化锆的四方相，而不改变界面断裂过程中的能量释放率。
