Zhao Yiran, Descamps Julie, Ababou-Girard Soraya, Bergamini Jean-François, Santinacci Lionel, Léger Yoan, Sojic Neso, Loget Gabriel
Univ Rennes, CNRS, ISCR (Institut des Sciences Chimiques de Rennes) UMR 6226, 35000, Rennes, France.
University of Bordeaux, Bordeaux INP, ISM, UMR CNRS 5255, 33607, Pessac, France.
Angew Chem Int Ed Engl. 2022 May 9;61(20):e202201865. doi: 10.1002/anie.202201865. Epub 2022 Mar 16.
Photoinduced electrochemiluminescence (PECL) allows the electrochemically assisted conversion of low-energy photons into high-energy photons at an electrode surface. This concept is expected to have important implications, however, it is dramatically limited by the stability of the surface, impeding future developments. Here, a series of metal-insulator-semiconductor (MIS) junctions, using photoactive n-type Si (n-Si) as a light absorber covered by a few-nanometer-thick protective SiO /metal (SiO /M, with M=Ru, Pt, and Ir) overlayers are investigated for upconversion PECL of the model co-reactant system involving the simultaneous oxidation of tris(bipyridine)ruthenium(II) and tri-n-propylamine. We show that n-Si/SiO /Pt and n-Si/SiO /Ir exhibit high photovoltages and record stabilities in operation (35 h for n-Si/SiO /Ir) for the generation of intense PECL with an anti-Stokes shift of 218 nm. We also demonstrate that these surfaces can be employed for spatially localized PECL. These unprecedented performances are extremely promising for future applications of PECL.
光致电化学发光(PECL)能够在电极表面将低能光子通过电化学辅助转化为高能光子。这一概念有望产生重要影响,然而,它受到表面稳定性的极大限制,阻碍了未来的发展。在此,研究了一系列金属-绝缘体-半导体(MIS)结,其中使用光活性n型硅(n-Si)作为光吸收体,并覆盖有几纳米厚的保护性SiO₂/金属(SiO₂/M,M = Ru、Pt和Ir)覆盖层,用于涉及三(联吡啶)钌(II)和三正丙胺同时氧化的模型共反应体系的上转换PECL。我们表明,n-Si/SiO₂/Pt和n-Si/SiO₂/Ir表现出高光电压,并且在产生具有218 nm反斯托克斯位移的强烈PECL时,在运行中具有创纪录的稳定性(n-Si/SiO₂/Ir为35小时)。我们还证明了这些表面可用于空间局部PECL。这些前所未有的性能对于PECL的未来应用极具前景。