Qi Xuanmeng, Yoshida Shinya, Tanaka Shuji
IEEE Trans Ultrason Ferroelectr Freq Control. 2022 May;69(5):1821-1828. doi: 10.1109/TUFFC.2022.3156881. Epub 2022 Apr 27.
To meet the growing demand for better piezoelectric thin films for microelectromechanical systems (MEMSs), we have developed an SM-doped Pb(Mg, Nb)O-PbTiO (Sm-PMN-PT) epitaxial thin film as a next-generation piezoelectric thin film to replace Pb(Zr, Ti)O (PZT). The inherent piezoelectricity | e | achieved 20 C/m, which is greater than those of intrinsic PZT thin films and the best Nb-doped PZT thin film. Besides, the simulation results show that the | e | value of the single Sm-PMN-PT film could be around 26 C/m. Meanwhile, the breakdown voltage of the as-deposited thin film was higher than 300 kV/cm. These results suggest the high potential of the Sm-PMN-PT epitaxial thin film for piezo-MEMS actuators with large displacement or force.
为满足对用于微机电系统(MEMS)的性能更优的压电薄膜日益增长的需求,我们已研发出一种掺钐的铅镁铌酸铅-钛酸铅(Sm-PMN-PT)外延薄膜,作为下一代压电薄膜来替代锆钛酸铅(PZT)。其固有压电常数|e|达到20 C/m,大于本征PZT薄膜以及最佳的掺铌PZT薄膜的压电常数。此外,模拟结果表明,单 Sm-PMN-PT 薄膜的|e|值可能约为26 C/m。同时,沉积态薄膜的击穿电压高于300 kV/cm。这些结果表明,Sm-PMN-PT外延薄膜在用于大位移或大力的压电MEMS致动器方面具有巨大潜力。