Evseeva G V, Kameneva S V
Genetika. 1977;13(11):1981-7.
To study the inheritance of the sensitivity to UV, X-rays, methylmethanesulphonate (MMS), nitrosoguanidine (NG) and nitrous acid (NA) in five uvs mutants of Aspergillus nidulans, having multiple sensitivity to these factors, the sensitivity of recombinants obtained from crossing uvs mutants with uvs+ strain, resistant to all the factors analysed, and uvs leads to uvs+ revertants is investigated. Four uvs mutants (15, 17, 19 and 26) are found to have a nomogenic control of sensitivity to different mutagens. In one mutant (uvs11) the sensitivity to five factors is controlled by two non-linked mutations, one of them determining the sensitivity to UV, NG, NA, and the other--to X-rays and MMC. Phenotypic manifestations of uvs mutations is modified by cell genotype, both chromosomal and cytoplasmic factors being responsible for the modification. Phenotypic modification of uvs mutation results in the change to some (but not to all) mutagenic factors. It suggests, that not the product of uvs gene, but some other components of the reparation complex are modified. Otherwise, reparation of different DNA damages can be carried out by a single enzyme acting in different reparation complexes.
为了研究构巢曲霉的5个对紫外线、X射线、甲磺酸甲酯（MMS）、亚硝基胍（NG）和亚硝酸（NA）敏感的uvs突变体对这些因素的敏感性遗传情况，这些突变体对这些因素具有多重敏感性，我们研究了将uvs突变体与对所有分析因素均有抗性的uvs+菌株杂交获得的重组体以及uvs向uvs+回复体的敏感性。发现4个uvs突变体（15、17、19和26）对不同诱变剂的敏感性受非等位基因控制。在一个突变体（uvs11）中，对5种因素的敏感性由两个不连锁的突变控制，其中一个决定对紫外线、NG、NA的敏感性，另一个决定对X射线和MMC的敏感性。uvs突变的表型表现受细胞基因型的影响，染色体和细胞质因素均参与这种影响。uvs突变的表型改变导致对某些（但不是所有）诱变因素的变化。这表明，不是uvs基因的产物，而是修复复合物的其他一些成分发生了改变。否则，不同DNA损伤的修复可以由一种在不同修复复合物中起作用的单一酶来完成。
