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通过硫取代掺杂调控二维六方氮化硼单层薄膜的光电特性

Engineering the Optoelectronic Properties of 2D Hexagonal Boron Nitride Monolayer Films by Sulfur Substitutional Doping.

作者信息

Tan Biying, Wu You, Gao Feng, Yang Huihui, Hu Yunxia, Shang Huiming, Zhang Xin, Zhang Jia, Li Zhonghua, Fu YongQing, Jia Dechang, Zhou Yu, Xiao Haiying, Hu PingAn

机构信息

School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150080, P. R. China.

Key Laboratory of Micro-Systems and Micro-Structures Manufacturing of Ministry of Education, Harbin Institute of Technology, Harbin 150080, P. R. China.

出版信息

ACS Appl Mater Interfaces. 2022 Apr 13;14(14):16453-16461. doi: 10.1021/acsami.2c01834. Epub 2022 Apr 4.

DOI:10.1021/acsami.2c01834
PMID:35373556
Abstract

Tuning the optical and electrical properties of two-dimensional (2D) hexagonal boron nitride (hBN) is critical for its successful application in optoelectronics. Herein, we report a new methodology to significantly enhance the optoelectronic properties of hBN monolayers by substitutionally doping with sulfur (S) on a molten Au substrate using chemical vapor deposition. The S atoms are more geometrically and energetically favorable to be doped in the N sites than in the B sites of hBN, and the S 3p orbitals hybridize with the B 2p orbitals, forming a new conduction band edge that narrows its band gap. The band edge positions change with the doping concentration of S atoms. The conductivity increases up to 1.5 times and enhances the optoelectronic properties, compared to pristine hBN. A photodetector made of a 2D S-doped hBN film shows an extended wavelength response from 260 to 280 nm and a 50 times increase in its photocurrent and responsivity with light illumination at 280 nm. These enhancements are mainly due to the improved light absorption and increased electrical conductivity through doping with sulfur. This S-doped hBN monolayer film can be used in the next-generation electronics, optoelectronics, and spintronics.

摘要

调整二维(2D)六方氮化硼(hBN)的光学和电学性质对其在光电子学中的成功应用至关重要。在此,我们报告一种新方法,通过在熔融金衬底上利用化学气相沉积用硫(S)进行替代掺杂,显著增强hBN单层的光电子性质。S原子在几何和能量上更倾向于掺杂在hBN的N位而非B位,并且S 3p轨道与B 2p轨道杂化,形成一个新的导带边缘,使其带隙变窄。带边位置随S原子的掺杂浓度而变化。与原始hBN相比,电导率提高了1.5倍,并增强了光电子性质。由二维S掺杂hBN薄膜制成的光电探测器显示出从260到280 nm的扩展波长响应,并且在280 nm光照下其光电流和响应度增加了50倍。这些增强主要归因于通过硫掺杂改善了光吸收并提高了电导率。这种S掺杂hBN单层薄膜可用于下一代电子学、光电子学和自旋电子学。

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