Wang Ye, Fu Xiuhua, Chen Yongyi, Lei Yuxin, Qin Li, Wang Lijun
Changchun University of Science and Technology, Changchun 130022, China.
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China.
Micromachines (Basel). 2022 Apr 16;13(4):632. doi: 10.3390/mi13040632.
Traditional reflective diffraction gratings working at 4.7 μm are fabricated by metal coatings. Due to the absorption of the metal itself, the diffraction efficiency (DE) could not reach over 95%. In this paper, we propose a 3 μm period multilayer grating design using hybrid multilayer dielectrics. With a layer of 0.353 μm Si and a layer of 0.905 μm SiO forming the rectangular grating, the maximum of larger than 99.99% and the overall first-order DE reached 97.88%. The usable spectrum width is larger than 0.2 μm, more than four times larger than that of the pure Si rectangular grating. This high DE multilayer grating is an ideal element for high-power laser systems with the spectrum beam combining method.
工作在4.7μm的传统反射衍射光栅是通过金属镀膜制造的。由于金属本身的吸收,衍射效率(DE)无法超过95%。在本文中,我们提出了一种使用混合多层电介质的3μm周期多层光栅设计。通过一层0.353μm的Si和一层0.905μm的SiO形成矩形光栅,最大值大于99.99%,整体一阶衍射效率达到97.88%。可用光谱宽度大于0.2μm,比纯Si矩形光栅的光谱宽度大四倍多。这种高衍射效率的多层光栅是采用光谱光束合成方法的高功率激光系统的理想元件。