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硅、铍、铝、氮和硫双掺杂对砷烯的影响:第一性原理见解

Effect of Si, Be, Al, N and S dual doping on arsenene: first-principles insights.

作者信息

Mushtaq Muhammad, Godara Sumegha, Khenata Rabah, Usman Hameed Muhammad

机构信息

Department of Physics, Women University of AJK 12500 Bagh Pakistan

Louisiana Tech University Louisiana USA.

出版信息

RSC Adv. 2021 Jul 20;11(41):25217-25227. doi: 10.1039/d1ra03394h. eCollection 2021 Jul 19.

Abstract

First-principles calculations based on density functional theory (DFT) have been performed to investigate the effect of Si/Be, Si/Al, Si/N and Si/S co-doping on the geometries, electronic structure, magnetism and particularly the adsorption of CO in arsenene. The results show that the incorporation of foreign atoms slightly distorts the host lattice. All doped structures are found to be thermodynamically stable. The replacement of host As atoms with foreign atoms results in some interesting changes in the electronic and magnetic properties of arsenene. The doped arsenene systems exhibit a semiconducting character with band gaps smaller than the original value of 1.59 eV due to the emergence of defect states within the actual band gap. Besides, arsenene remains nonmagnetic (NM) upon Si/Be or Si/S dual doping, whereas both Si/Al and Si/N dopings induce magnetism with a total magnetic moment of 1 μ. Finally, the adsorption of CO molecules over pristine arsenene (p-As) and dual doped arsenene systems is investigated in terms of adsorption energy, adsorption height, charge transfer, charge density difference (CDD), work function, electronic band structures and density of states. It is observed that CO molecule has physisorption over p-As, SiAl-As, SiN-As and SiS-As systems, whereas chemisorption is reported for the SiBe-As system. Our study suggests that chemically modifying arsenene with suitable dopants might extend its applications in spintronic and gas sensing applications.

摘要

基于密度泛函理论(DFT)进行了第一性原理计算,以研究硅/铍、硅/铝、硅/氮和硅/硫共掺杂对砷烯的几何结构、电子结构、磁性,特别是对一氧化碳吸附的影响。结果表明,外来原子的掺入使主体晶格略有畸变。所有掺杂结构在热力学上都是稳定的。用外来原子取代主体砷原子会导致砷烯的电子和磁性发生一些有趣的变化。由于实际带隙内出现缺陷态,掺杂砷烯系统表现出半导体特性,其带隙小于原始值1.59电子伏特。此外,在硅/铍或硅/硫双掺杂后,砷烯保持非磁性(NM),而硅/铝和硅/氮掺杂都诱导出总磁矩为1μ的磁性。最后,从吸附能、吸附高度、电荷转移、电荷密度差(CDD)、功函数、电子能带结构和态密度等方面研究了一氧化碳分子在原始砷烯(p-As)和双掺杂砷烯系统上的吸附。观察到一氧化碳分子在p-As、SiAl-As、SiN-As和SiS-As系统上发生物理吸附,而在SiBe-As系统上发生化学吸附。我们的研究表明,用合适的掺杂剂对砷烯进行化学修饰可能会扩展其在自旋电子学和气体传感应用中的应用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/748a/9037023/9f27ef87b345/d1ra03394h-f1.jpg

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