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从金电极到富勒烯掺杂三苯胺衍生物层的高效空穴注入。

Highly efficient hole injection from Au electrode to fullerene-doped triphenylamine derivative layer.

作者信息

Matsuda Shofu, Itagaki Chikara, Tatsuguchi Kyoya, Ito Masamichi, Sasaki Hiroto, Umeda Minoru

机构信息

Department of Materials Science and Technology, Graduate School of Engineering, Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, Niigata, 940-2188, Japan.

出版信息

Sci Rep. 2022 May 4;12(1):7294. doi: 10.1038/s41598-022-10983-6.

DOI:10.1038/s41598-022-10983-6
PMID:35508519
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9068712/
Abstract

Triphenylamine derivatives are superior hole-transport materials. For their application to high-functional organic semiconductor devices, efficient hole injection at the electrode/triphenylamine derivative interface is required. Herein, we report the design and evaluation of a Au/fullerene-doped α-phenyl-4'-[(4-methoxyphenyl)phenylamino]stilbene (TPA) buffer layer/TPA/Au layered device. It exhibits rectification conductivity, indicating that hole injection occurs more easily at the Au/fullerene-doped TPA interface than at the Au/TPA interface. The Richardson-Schottky analysis of the device reveals that the hole injection barrier (Φ) at the Au/fullerene-doped TPA interface decreases to 0.021 eV upon using C as a dopant, and Φ of Au/TPA is as large as 0.37 eV. The reduced Φ of 0.021 eV satisfies the condition for ohmic contact at room temperature (Φ [Formula: see text] 0.025 eV). Notably, C doping has a higher barrier-reduction effect than C doping. Furthermore, a noteworthy hole-injection mechanism, in which the ion-dipole interaction between TPA and fullerenes plays an important role in reducing the barrier height, is considered based on cyclic voltammetry. These results should facilitate the design of an electrode/organic semiconductor interface for realizing low-voltage driven organic devices.

摘要

三苯胺衍生物是优良的空穴传输材料。对于它们在高功能有机半导体器件中的应用,需要在电极/三苯胺衍生物界面处实现高效的空穴注入。在此,我们报道了一种Au/富勒烯掺杂的α-苯基-4'-[(4-甲氧基苯基)苯基氨基]芪(TPA)缓冲层/TPA/Au层状器件的设计与评估。该器件呈现出整流导电性,这表明空穴注入在Au/富勒烯掺杂的TPA界面处比在Au/TPA界面处更容易发生。对该器件的理查森-肖特基分析表明,使用C作为掺杂剂时,Au/富勒烯掺杂的TPA界面处的空穴注入势垒(Φ)降至0.021 eV,而Au/TPA的Φ高达0.37 eV。0.021 eV的降低后的Φ满足室温下欧姆接触的条件(Φ [公式:见正文] 0.025 eV)。值得注意的是,C掺杂比C掺杂具有更高的势垒降低效果。此外,基于循环伏安法考虑了一种值得注意的空穴注入机制,其中TPA与富勒烯之间的离子-偶极相互作用在降低势垒高度方面起着重要作用。这些结果应有助于设计用于实现低压驱动有机器件的电极/有机半导体界面。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/b5722fd97487/41598_2022_10983_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/664283be7742/41598_2022_10983_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/426be66ef6f1/41598_2022_10983_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/8554ba3f0e74/41598_2022_10983_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/2ae3376a61ed/41598_2022_10983_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/21890fde1e4d/41598_2022_10983_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/b5722fd97487/41598_2022_10983_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/664283be7742/41598_2022_10983_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/426be66ef6f1/41598_2022_10983_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/8554ba3f0e74/41598_2022_10983_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/2ae3376a61ed/41598_2022_10983_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/21890fde1e4d/41598_2022_10983_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/abf3/9068712/b5722fd97487/41598_2022_10983_Fig6_HTML.jpg

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