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有和没有外部电场的掺杂石墨烯的结构与性质的理论研究。

Theoretical studies on the structures and properties of doped graphenes with and without an external electrical field.

作者信息

Wang Yuhua, Wang Weihua, Zhu Shuyun, Yang Ge, Zhang Zhiqiang, Li Ping

机构信息

Administrative Office of Laboratory and Equipment, Qufu Normal University 273165 Qufu Shandong PR China

College of Chemistry and Chemical Engineering, Qufu Normal University 273165 Qufu Shandong PR China

出版信息

RSC Adv. 2019 Apr 16;9(21):11939-11950. doi: 10.1039/c9ra00326f. eCollection 2019 Apr 12.

Abstract

To expand the applications of graphene in optoelectronic devices, B, Al, Si, Ge, As, and Sb doped graphenes (marked as B-G, Al-G, Si-G, Ge-G, As-G, and Sb-G, respectively) were synthesised. The geometric structures, population analyses, and also electronic and optical properties of these doped graphene materials were investigated employing the density functional theory (DFT) method. It was shown that the band gaps of doped graphenes were opened and their absorption spectra were red-shifted by the addition of doping atoms, and their dielectric functions and refractive indexes of low frequency were decreased compared with those of pure graphene. Moreover, the electronic and optical properties of doped graphenes under an external electrical field ranging from -0.4 to 1.2 eV Å have been explored. It was found that the band gaps of As-G and Sb-G were increased to 0.864 and 1.841 eV under a 1.2 eV Å external electrical field, respectively. On the contrary, the band gaps of B-G, Al-G, Si-G, and Ge-G were decreased with the increase of the external electrical field intensity. Additionally, the absorption peaks of B-G, Al-G, Si-G, and Ge-G were red-shifted upon applying the external electrical field. Correspondingly, their dielectric functions and refractive indexes of low frequency were increased. Surprisingly, the absorption spectra, dielectric functions, and refractive indexes of As-G and Sb-G have no significant changes.

摘要

为了拓展石墨烯在光电器件中的应用,合成了硼、铝、硅、锗、砷和锑掺杂的石墨烯(分别标记为B-G、Al-G、Si-G、Ge-G、As-G和Sb-G)。采用密度泛函理论(DFT)方法研究了这些掺杂石墨烯材料的几何结构、布居分析以及电子和光学性质。结果表明,掺杂石墨烯的带隙被打开,并且由于掺杂原子的加入其吸收光谱发生红移,与纯石墨烯相比,其低频介电函数和折射率降低。此外,还研究了掺杂石墨烯在-0.4至1.2 eV Å的外部电场下的电子和光学性质。发现在1.2 eV Å的外部电场下,As-G和Sb-G的带隙分别增加到0.864和1.841 eV。相反,B-G、Al-G、Si-G和Ge-G的带隙随着外部电场强度的增加而减小。此外,施加外部电场后,B-G、Al-G、Si-G和Ge-G的吸收峰发生红移。相应地,它们的低频介电函数和折射率增加。令人惊讶的是,As-G和Sb-G的吸收光谱、介电函数和折射率没有显著变化。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/594e/9063496/8f6a829a9f2b/c9ra00326f-f1.jpg

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