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通过光学带隙获取新型二维半导体：铁插层二硒化钛薄膜的低压化学气相沉积合成法。

Accessing new 2D semiconductors with optical band gap: synthesis of iron-intercalated titanium diselenide thin films LPCVD.

作者信息

Sanchez-Perez Clara, Knapp Caroline E, Colman Ross H, Sotelo-Vazquez Carlos, Oilunkaniemi Raija, Laitinen Risto S, Carmalt Claire J

机构信息

University College London, Department of Chemistry 20 Gordon St London WC1H 0AJ UK

Laboratory of Inorganic Chemistry, Environmental and Chemical Engineering, University of Oulu P. O. Box 3000 FI-90014 Oulu Finland

出版信息

RSC Adv. 2018 Jun 20;8(40):22552-22558. doi: 10.1039/c8ra03174f. eCollection 2018 Jun 19.

DOI:10.1039/c8ra03174f
PMID:35539712
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9081417/
Abstract

Fe-doped TiSe thin-films were synthesized low pressure chemical vapor deposition (LPCVD) of a single source precursor: [Fe(η-CHSe)Ti(η-CH)] (1). Samples were heated at 1000 °C for 1-18 h and cooled to room temperature following two different protocols, which promoted the formation of different phases. The resulting films were analyzed by grazing incidence X-ray diffraction (GIXRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM) and UV/vis spectroscopy. An investigation of the Fe doping limit from a parallel pyrolysis study of Fe TiSe powders produced during LPCVD depositions has shown an increase in the Fe-TiSe-Fe layer width with Fe at% increase. Powders were analyzed using powder X-ray diffraction (PXRD) involving Rietveld refinement and XPS. UV/vis measurements of the semiconducting thin films show a shift in band gap with iron doping from 0.1 eV (TiSe) to 1.46 eV (FeTiSe).

摘要

通过单源前驱体[Fe(η-CHSe)Ti(η-CH)] (1)的低压化学气相沉积(LPCVD)合成了铁掺杂的TiSe薄膜。将样品在1000 °C下加热1 - 18小时，并按照两种不同的程序冷却至室温，这促进了不同相的形成。通过掠入射X射线衍射(GIXRD)、X射线光电子能谱(XPS)、扫描电子显微镜(SEM)和紫外/可见光谱对所得薄膜进行了分析。对LPCVD沉积过程中产生的Fe-TiSe粉末进行平行热解研究，以探究铁掺杂极限，结果表明随着铁原子百分比的增加，Fe-TiSe-Fe层宽度增加。使用涉及Rietveld精修的粉末X射线衍射(PXRD)和XPS对粉末进行了分析。对半导体薄膜的紫外/可见测量表明，随着铁掺杂，带隙从0.1 eV (TiSe) 移动到1.46 eV (FeTiSe)。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/77ace82d5de2/c8ra03174f-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/593bd56701cd/c8ra03174f-s1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/6c01a6d8d026/c8ra03174f-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/7a68c9bf9f82/c8ra03174f-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/ebee0c218ad3/c8ra03174f-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/d974303f5347/c8ra03174f-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/5ad5215375e7/c8ra03174f-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/77ace82d5de2/c8ra03174f-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/593bd56701cd/c8ra03174f-s1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/6c01a6d8d026/c8ra03174f-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/7a68c9bf9f82/c8ra03174f-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/ebee0c218ad3/c8ra03174f-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/d974303f5347/c8ra03174f-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/5ad5215375e7/c8ra03174f-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/487f/9081417/77ace82d5de2/c8ra03174f-f6.jpg

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