Dai Xin, Lei Hongwei, Chen Cong, Guo Yaxiong, Fang Guojia
Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education of China, School of Physics and Technology, Wuhan University Wuhan 430072 PR China.
Shenzhen Institute of Wuhan University Shenzhen 518055 PR China
RSC Adv. 2018 May 8;8(30):16887-16896. doi: 10.1039/c8ra01299g. eCollection 2018 May 3.
Inorganic p-type films with high mobility are very important for opto-electronic applications. It is very difficult to synthesize p-type films with a wider, tunable band gap energy and suitable band energy levels. In this research, p-type copper aluminum sulfide (Cu Al S ) films with tunable optical band gap, carrier density, hole mobility and conductivity were first synthesized using a simple, low cost and low temperature chemical bath deposition method. These fabricated Cu Al S films were deposited at 60 °C using an aqueous solution of copper(ii) chloride dihydrate (CuCl·2HO), aluminium nitrate nonohydrate [Al(NO)·9HO], thiourea [(NH)CS], and ammonium hydroxide, with citric acid as the complexing agent. Upon varying the ratio of the precursor, the band gap of the Cu Al S films can be tuned from 2.63 eV to 4.01 eV. The highest hole mobility obtained was 1.52 cm V s and the best conductivity obtained was 546 S cm. The Cu Al S films were used as a hole transporting layer (HTL) in organic solar cells (OSCs), and a good performance of the OSCs was demonstrated using the Cu Al S films as the HTL. These results demonstrate the remarkable potential of Cu Al S as hole transport material for opto-electronic devices.
具有高迁移率的无机p型薄膜对于光电子应用非常重要。合成具有更宽、可调节带隙能量和合适能带能级的p型薄膜非常困难。在本研究中,首先使用简单、低成本且低温的化学浴沉积法合成了具有可调光学带隙、载流子密度、空穴迁移率和电导率的p型硫化铜铝(CuₓAlₙSₘ)薄膜。这些制备的CuₓAlₙSₘ薄膜是在60°C下使用二水合氯化铜(CuCl₂·2H₂O)、九水合硝酸铝[Al(NO₃)₃·9H₂O]、硫脲[(NH₂)₂CS]和氢氧化铵的水溶液,并以柠檬酸作为络合剂沉积而成。通过改变前驱体的比例,CuₓAlₙSₘ薄膜的带隙可从2.63 eV调节到4.01 eV。获得的最高空穴迁移率为1.52 cm² V⁻¹ s⁻¹,最佳电导率为546 S cm⁻¹。CuₓAlₙSₘ薄膜被用作有机太阳能电池(OSC)中的空穴传输层(HTL),并且使用CuₓAlₙSₘ薄膜作为HTL展示了OSC的良好性能。这些结果证明了CuₓAlₙSₘ作为光电器件空穴传输材料的巨大潜力。