Arsentev M Yu, Petrov A V, Missyul A B, Hammouri M
Institute of Silicate Chemistry, Russian Academy of Sciences St. Petersburg 199034 Russia
Chemistry Department, Saint Petersburg State University Universitetsky pr. 26, Petrodvorets 198504 Saint Petersburg Russia.
RSC Adv. 2018 Jul 20;8(46):26169-26179. doi: 10.1039/c8ra04417a. eCollection 2018 Jul 19.
The possibility of H molecule adsorption on the basal plane of monolayer TiS at various sites has been studied. Among the studied adsorption sites, few sites were found to be suitable for physisorption with binding energy up to 0.10 eV per H. To increase the activity of hydrogen sorption, the possibility of generating S-vacancies, by removing sulfur atoms from the basal plane of monolayer TiS was investigated. Despite the fact that the structures containing vacancies were found to be stable enough, there was no increase in the activity towards hydrogen adsorption. The same effect was obtained with the use of common methods of increasing of the H adsorption energy: the decoration of the two-dimensional material with alkali metals (Li, Na). This might be caused by the negatively charged surfaces of single layer TiS, which hinder the increase in binding by alkali metals through a weak electrostatic interaction.
研究了H分子在单层TiS基面不同位置吸附的可能性。在所研究的吸附位置中,发现只有少数位置适合物理吸附,每个H的结合能高达0.10 eV。为了提高氢吸附活性,研究了通过从单层TiS基面去除硫原子来产生S空位的可能性。尽管发现含有空位的结构足够稳定,但氢吸附活性并未增加。使用增加H吸附能的常用方法(用碱金属(Li、Na)修饰二维材料)也得到了相同的结果。这可能是由于单层TiS带负电的表面,通过弱静电相互作用阻碍了碱金属结合的增加。