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通过时域布里渊散射对有机硅薄膜中光诱导改性过程的成像

Imaging of a Light-Induced Modification Process in Organo-Silica Films via Time-Domain Brillouin Scattering.

作者信息

Sandeep Sathyan, Vishnevskiy Alexey S, Raetz Samuel, Naumov Sergej, Seregin Dmitry S, Husiev Artem, Vorotilov Konstantin A, Gusev Vitalyi E, Baklanov Mikhail R

机构信息

Laboratoire d'Acoustique de l'Université du Mans (LAUM), UMR 6613, Institut d'Acoustique-Graduate School (IA-GS), CNRS, Le Mans Université, 72085 Le Mans, France.

MIREA-Russian Technological University, 119454 Moscow, Russia.

出版信息

Nanomaterials (Basel). 2022 May 9;12(9):1600. doi: 10.3390/nano12091600.

Abstract

We applied time-domain Brillouin scattering (TDBS) for the characterization of porogen-based organosilicate glass (OGS) films deposited by spin-on-glass technology and cured under different conditions. Although the chemical composition and porosity measured by Fourier-transform infrared (FTIR) spectroscopy and ellipsometric porosimetry (EP) did not show significant differences between the films, remarkable differences between them were revealed by the temporal evolution of the Brillouin frequency (BF) shift of the probe light in the TDBS. The observed modification of the BF was a signature of the light-induced modification of the films in the process of the TDBS experiments. It correlated to the different amount of carbon residue in the samples, the use of ultraviolet (UV) femtosecond probe laser pulses in our optical setup, and their intensity. In fact, probe radiation with an optical wavelength of 356 nm appeared to be effective in removing carbon residue through single-photon absorption processes, while its two-photon absorption might have led to the breaking of Si-CH bonds in the OSG matrix. The quantum chemical calculations confirmed the latter possibility. This discovery demonstrates the possibility of local modifications of OSG films with a nanometric resolution via nonlinear optical processes, which could be important, among other applications, for the creation of active surface sites in the area-selective deposition of atomic layers.

摘要

我们应用时域布里渊散射(TDBS)来表征通过旋涂玻璃技术沉积并在不同条件下固化的基于致孔剂的有机硅酸盐玻璃(OGS)薄膜。尽管通过傅里叶变换红外(FTIR)光谱和椭偏测孔法(EP)测量的薄膜化学成分和孔隙率没有显示出显著差异,但TDBS中探测光的布里渊频率(BF) shift随时间的演变揭示了它们之间的显著差异。观察到的BF变化是TDBS实验过程中薄膜光致改性的标志。它与样品中不同量的碳残留、我们光学装置中使用的紫外(UV)飞秒探测激光脉冲及其强度有关。事实上,波长为356 nm的探测辐射似乎通过单光子吸收过程有效地去除了碳残留,而其二光子吸收可能导致了OSG基质中Si-CH键的断裂。量子化学计算证实了后一种可能性。这一发现证明了通过非线性光学过程以纳米分辨率对OSG薄膜进行局部改性的可能性,这在其他应用中可能很重要,例如在原子层区域选择性沉积中创建活性表面位点。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/9aa6/9106017/f803de601b36/nanomaterials-12-01600-g001.jpg

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