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基于锗掺杂缺陷和 D 型微结构光纤的高灵敏度表面等离子体共振传感器。

High Sensitivity Surface Plasmon Resonance Sensor Based on a Ge-Doped Defect and D-Shaped Microstructured Optical Fiber.

机构信息

Post-Graduated Program in Electrical and Computer Engineering, Technology Center, Federal University of Rio Grande do Norte, Natal 59078-970, Brazil.

出版信息

Sensors (Basel). 2022 Apr 22;22(9):3220. doi: 10.3390/s22093220.

Abstract

In this work a plasmonic sensor with a D-Shaped microstructured optical fiber (MOF) is proposed to detect a wide range of analyte refractive index (RI ;na) by doping the pure silica (SiO2) core with distinct concentrations of Germanium Dioxide (GeO2), causing the presentation of high spectral sensitivity. In this case, the fiber is shaped by polishing a coating of SiO2, on the region that will be doped with GeO2, in the polished area, a thin gold (Au) layer, which constitutes the plasmonic material, is introduced, followed by the analyte, in a way which the gold layer is deposited between the SiO2. and the analyte. The numerical results obtained in the study shows that the sensor can determine efficiently a range of 0.13 refractive index units (RIU), with a limit operation where na varies from 1.32 to 1.45. Within this application, the sensor has reached an average wavelength sensitivity (WS) of up to 11,650.63 nm/RIU. With this level of sensitivity, the D-Shaped format and wide range of na detection, the proposed fiber has great potential for sensing applications in several areas.

摘要

在这项工作中,提出了一种基于 D 形微结构光纤(MOF)的等离子体传感器,通过用不同浓度的二氧化锗(GeO2)掺杂纯二氧化硅(SiO2)芯,实现了对宽范围分析物折射率(RI;na)的检测,从而呈现出高光谱灵敏度。在这种情况下,通过在将掺杂 GeO2 的区域上抛光一层 SiO2,对光纤进行塑形,在抛光区域中引入一层薄薄的金(Au)层,构成等离子体材料,然后在金层沉积在 SiO2 和分析物之间的方式引入分析物。研究中获得的数值结果表明,传感器可以有效地确定 0.13 折射率单位(RIU)的范围,其操作极限为 na 从 1.32 到 1.45 变化。在这种应用中,传感器的平均波长灵敏度(WS)高达 11,650.63nm/RIU。凭借这种灵敏度水平、D 形格式和宽的 na 检测范围,所提出的光纤在多个领域的传感应用中具有很大的潜力。

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