通过X射线光电子能谱对新型五元合金Ti-Zr-V-Hf-Nb非蒸散型吸气剂进行活化表征

Activation characterization of a novel quinary alloy Ti-Zr-V-Hf-Nb non-evaporable getters by x-ray photoelectron spectroscopy.

作者信息

Wang Jie, Gao Yong, Hu Yaocheng, Zhang Jing, You Zhiming, Sun Qiuyu, Si Qingyu, Xu Zhanglian, Wang Sheng, Liu Guoming, Mi Aijun

机构信息

Shaanxi Engineering Research Center of Advanced Nuclear Energy, Shaanxi Key Laboratory of Advanced Nuclear Energy and Technology, School of Nuclear Science and Technology, School of Energy and Power Engineering, Xi'an Jiaotong University, Xi'an, Shaanxi 710049, China.

China Nuclear Power Engineering Co., Ltd., Beijing 100840, China.

出版信息

Rev Sci Instrum. 2022 May 1;93(5):053906. doi: 10.1063/5.0079537.

DOI:10.1063/5.0079537

PMID:35649754

Abstract

The first results on the activation process and mechanisms of novel quinary alloy Ti-Zr-V-Hf-Nb non-evaporable getter (NEG) film coatings with copper substrates were presented. About 1.075 µm of Ti-Zr-V-Hf-Nb NEG film coating was deposited on the copper substrates by using the DC sputtering method. The NEG activation at 100, 150, and 180 °C, respectively, for 2 h was in situ characterized by x-ray photoelectron spectroscopy (XPS). The as-deposited NEG film mainly comprised the high valence state metallic oxides and the sub-oxides, as well as a small number of metals. The in situ XPS studies indicated that the concentrations of the high-oxidized states of Ti, Zr, V, Hf, and Nb gradually decreased and that of the lower valence metallic oxides and metallic states increased in steps, when the activation temperature increased from 100 to 180 °C. This outcome manifested that these novel quinary alloy Ti-Zr-V-Hf-Nb NEG film coatings could be activated and used for producing ultra-high vacuum.

摘要

首次展示了在铜衬底上新型五元合金Ti-Zr-V-Hf-Nb非蒸散型吸气剂（NEG）薄膜涂层的激活过程和机制的研究结果。采用直流溅射法在铜衬底上沉积了约1.075μm厚的Ti-Zr-V-Hf-Nb NEG薄膜涂层。分别在100、150和180°C下对NEG进行2小时的激活处理，并通过X射线光电子能谱（XPS）进行原位表征。沉积态的NEG薄膜主要由高价态金属氧化物和低价氧化物以及少量金属组成。原位XPS研究表明，当激活温度从100°C升高到180°C时，Ti、Zr、V、Hf和Nb的高氧化态浓度逐渐降低，低价金属氧化物和金属态浓度逐步增加。这一结果表明，这些新型五元合金Ti-Zr-V-Hf-Nb NEG薄膜涂层可以被激活并用于制造超高真空。