Mao Ge-Qi, Yan Zhao-Yi, Xue Kan-Hao, Ai Zhengwei, Yang Shengxin, Cui Hanli, Yuan Jun-Hui, Ren Tian-Ling, Miao Xiangshui
School of Integrated Circuits, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, 430074, People's Republic of China.
Hubei Yangtze Memory Laboratories, Wuhan 430205, People's Republic of China.
J Phys Condens Matter. 2022 Aug 3;34(40). doi: 10.1088/1361-648X/ac829d.
It is known that the Kohn-Sham eigenvalues do not characterize experimental excitation energies directly, and the band gap of a semiconductor is typically underestimated by local density approximation (LDA) of density functional theory (DFT). An embarrassing situation is that one usually uses LDA+for strongly correlated materials with rectified band gaps, but for non-strongly-correlated semiconductors one has to resort to expensive methods like hybrid functionals or. In spite of the state-of-the-art meta-generalized gradient approximation functionals like TB-mBJ and SCAN, methods with LDA-level complexity to rectify the semiconductor band gaps are in high demand. DFT-1/2 stands as a feasible approach and has been more widely used in recent years. In this work we give a detailed derivation of the Slater half occupation technique, and review the assumptions made by DFT-1/2 in semiconductor band structure calculations. In particular, the self-energy potential approach is verified through mathematical derivations. The aims, features and principles of shell DFT-1/2 for covalent semiconductors are also accounted for in great detail. Other developments of DFT-1/2 including conduction band correction, DFT+-1/2, empirical formula for the self-energy potential cutoff radius, etc, are further reviewed. The relations of DFT-1/2 to hybrid functional, sX-LDA,, self-interaction correction, scissor's operator as well as DFT+are explained. Applications, issues and limitations of DFT-1/2 are comprehensively included in this review.
众所周知,科恩-沈(Kohn-Sham)本征值并不直接表征实验激发能,并且半导体的带隙通常会被密度泛函理论(DFT)的局域密度近似(LDA)低估。一个尴尬的情况是,对于具有修正带隙的强关联材料,人们通常使用LDA+,但对于非强关联半导体,人们不得不诉诸于诸如杂化泛函等昂贵的方法。尽管有像TB-mBJ和SCAN这样的先进元广义梯度近似泛函,但仍迫切需要具有LDA水平复杂度的方法来修正半导体带隙。DFT-1/2是一种可行的方法,近年来得到了更广泛的应用。在这项工作中,我们详细推导了斯莱特半占据技术,并回顾了DFT-1/2在半导体能带结构计算中所做的假设。特别是,通过数学推导验证了自能势方法。还详细阐述了用于共价半导体的壳层DFT-1/2的目的、特点和原理。进一步回顾了DFT-1/2的其他发展,包括导带修正、DFT+-1/2、自能势截止半径的经验公式等。解释了DFT-1/2与杂化泛函、sX-LDA、自相互作用修正、剪刀算符以及DFT+的关系。本综述全面涵盖了DFT-1/2的应用、问题和局限性。