Zdzienicka M Z, Simons J W
Mutat Res. 1987 Jun;178(2):235-44. doi: 10.1016/0027-5107(87)90274-0.
A replica-plating technique has been adopted for the isolation of mutagen-sensitive mutants of Chinese hamster V79 and CHO cell lines. After the mutagenic treatment (ENU) clones derived from these cell lines were replica plated into micro wells and replicas were treated with UV (254 nm), X-ray, MMC, EMC or MMS. Clonal cell lines which demonstrated mutagen sensitivity were retested by the determination of survival. Only one UV-sensitive line was obtained in 1500 clonal lines derived from CHO cells. This mutant appeared also sensitive to 4NQO and MMC. The sensitivity to UV and MMC was 2-3-fold enhanced, while the increase in sensitivity to 4NQO was 4-5-fold. In V79 cells 9 mutagen-sensitive lines were found after screening of 500 clonal lines; six of them showed increased sensitivity towards UV, two towards MMC, and one cell line was found to be X-ray sensitive. A considerable cross-sensitivity for the various agents was found among the isolated mutants. When a 2-fold increase is taken as a minimum to indicate mutagen sensitivity 6 mutants were sensitive to UV, 8 mutants were sensitive to MMC, 6 mutants were sensitive to 4NQO and 4 mutants were sensitive to X-rays. The difference in sensitivity to UV versus 4NQO makes it unlikely that 4NQO can be considered as a UV-mimetic agent. The sensitivity to MMC appears to fall into 2 classes: a class with moderate sensitivity (2-8-fold) and a class with high sensitivity (30-100-fold). The presence of similar classes is indicated for UV. Except for the two lines V-E5, V-B7 and the two lines V-H11, V-H4 all obtained mutants have a different spectrum of mutagen sensitivities which suggests that different genetic alterations underly these effects. The observed high frequency of mutagen-sensitive mutants in V79 cells, although unexpected and substantially higher than those published for CHO cells and L5178Y cells, can still be explained by the presence of functionally hemizygous loci.
已采用影印培养技术来分离中国仓鼠V79和CHO细胞系的诱变敏感突变体。经诱变处理(ENU)后,将源自这些细胞系的克隆影印接种到微孔板中,并用紫外线(254 nm)、X射线、丝裂霉素C(MMC)、乙基亚硝基脲(EMC)或甲基磺酸甲酯(MMS)处理复制品。通过测定存活率对表现出诱变敏感性的克隆细胞系进行重新检测。在源自CHO细胞的1500个克隆系中仅获得1个紫外线敏感系。该突变体对4-硝基喹啉-1-氧化物(4NQO)和MMC也表现出敏感性。对紫外线和MMC的敏感性提高了2至3倍,而对4NQO的敏感性提高了4至5倍。在V79细胞中,筛选500个克隆系后发现9个诱变敏感系;其中6个对紫外线敏感性增加,2个对MMC敏感性增加,1个细胞系对X射线敏感。在分离出的突变体中发现了对各种诱变剂的显著交叉敏感性。当以增加2倍作为表明诱变敏感性的最低标准时,6个突变体对紫外线敏感,8个突变体对MMC敏感,6个突变体对4NQO敏感,4个突变体对X射线敏感。对紫外线和4NQO敏感性的差异使得4NQO不太可能被视为紫外线模拟剂。对MMC的敏感性似乎分为2类:一类是中等敏感性(2至8倍),另一类是高敏感性(30至100倍)。紫外线也显示出类似的类别。除了V-E5、V-B7这两个细胞系以及V-H11、V-H4这两个细胞系外,所有获得的突变体都有不同的诱变敏感性谱,这表明这些效应背后存在不同的基因改变。在V79细胞中观察到的诱变敏感突变体的高频率,尽管出乎意料且大大高于已发表的CHO细胞和L5178Y细胞的频率,但仍可通过功能性半合子位点的存在来解释。