Chu Zengyong, Li Guochen, Gong Xiaofeng, Zhao Zhenkai, Tan Yinlong, Jiang Zhenhua
College of Liberal Arts and Science, National University of Defense Technology, Changsha 410073, China.
Polymers (Basel). 2022 Jul 9;14(14):2800. doi: 10.3390/polym14142800.
Flexible, stretchable, wearable, and stable electronic materials are widely studied, owing to their applications in wearable devices and the Internet of Things. Because of the demands for both strain-insensitive resistors and high gauge factor (GF) strain-sensitive materials, anisotropic strain sensitivity has been an important aspect of electronic materials. In addition, the materials should have adjustable strain sensitivities. In this work, such properties are demonstrated in reduced graphene oxide (RGO) with hierarchical oriented wrinkle microstructures, generated using the two-step shrinkage of a rubber substrate. The GF values range from 0.15 to 28.32 at 100% strain. For device demonstrations, macrostructure patterns are designed to prepare patterned wrinkling graphene at rubber substrate (PWG@R). Serpentiform curves can be used for the constant-value resistor, combined with the first-grade wrinkles. Strip lines can increase the strain-sensing property, along with the second-grade wrinkles. The patterned sensor exhibits improved GF values range from 0.05 to 49.5. The assembled sensor shows an excellent stability (>99% retention after 600 cycles) with a high GF (49.5). It can monitor the vital signs of the throat and wrist and sense large motions of fingers. Thus, PWG@R-based strain sensors have great potential in various health or motion monitoring fields.
由于在可穿戴设备和物联网中的应用,柔性、可拉伸、可穿戴且稳定的电子材料受到广泛研究。鉴于对应变不敏感电阻器和高应变系数(GF)应变敏感材料的需求,各向异性应变敏感性一直是电子材料的一个重要方面。此外,材料应具有可调节的应变敏感性。在这项工作中,通过橡胶基底的两步收缩生成的具有分级取向皱纹微结构的还原氧化石墨烯(RGO)展现出了这些特性。在100%应变下,GF值范围为0.15至28.32。为了进行器件演示,设计宏观结构图案以在橡胶基底上制备图案化皱纹石墨烯(PWG@R)。蛇形曲线可与一级皱纹结合用于恒值电阻器。带状线可与二级皱纹一起提高应变传感性能。图案化传感器的GF值范围为0.05至49.5,有所改善。组装后的传感器显示出优异的稳定性(600次循环后保留率>99%)和高GF值(49.5)。它可以监测喉咙和手腕的生命体征,并感知手指的大幅度运动。因此,基于PWG@R的应变传感器在各种健康或运动监测领域具有巨大潜力。