全介质透反射角不敏感近红外（NIR）滤波器

All-Dielectric Transreflective Angle-Insensitive Near-Infrared (NIR) Filter.

作者信息

Shaukat Ayesha, Umer Rahila, Noble Frazer, Arif Khalid Mahmood

机构信息

Department of Mechanical and Electrical Engineering, SF&AT, Massey University, Auckland 0632, New Zealand.

Engineering and Management Sciences, Balochistan University of Information Technology, Quetta 87100, Pakistan.

出版信息

Nanomaterials (Basel). 2022 Jul 23;12(15):2537. doi: 10.3390/nano12152537.

DOI:10.3390/nano12152537

PMID:35893505

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9370116/

Abstract

This paper presents an all-dielectric, cascaded, multilayered, thin-film filter, allowing near-infrared filtration for spectral imaging applications. The proposed design is comprised of only eight layers of amorphous silicon (A-Si) and silicon nitride (Si3N4), successively deposited on a glass substrate. The finite difference time domain (FDTD) simulation results demonstrate a distinct peak in the near-infrared (NIR) region with transmission efficiency up to 70% and a full-width-at-half-maximum (FWHM) of 77 nm. The theoretical results are angle-insensitive up to 60∘ and show polarization insensitivity in the transverse magnetic (TM) and transverse electric (TE) modes. The theoretical response, obtained with the help of spectroscopic ellipsometry (SE), is in good agreement with the experimental result. Likewise, the experimental results for polarization insensitivity and angle invariance of the thin films are in unison with the theoretical results, having an angle invariance up to 50∘.

摘要

本文提出了一种全介质、级联、多层薄膜滤波器，可用于光谱成像应用中的近红外滤波。所提出的设计仅由八层非晶硅（A-Si）和氮化硅（Si3N4）组成，依次沉积在玻璃基板上。时域有限差分（FDTD）模拟结果表明，在近红外（NIR）区域有一个明显的峰值，传输效率高达70%，半高宽（FWHM）为77 nm。理论结果在高达60°的角度范围内不敏感，并且在横向磁（TM）和横向电（TE）模式下表现出偏振不敏感。借助光谱椭偏仪（SE）获得的理论响应与实验结果吻合良好。同样，薄膜的偏振不敏感和角度不变性的实验结果与理论结果一致，角度不变性高达50°。