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氧化物半导体中单个掺杂原子的原子尺度三维成像。

Atomic-scale 3D imaging of individual dopant atoms in an oxide semiconductor.

作者信息

Hunnestad K A, Hatzoglou C, Khalid Z M, Vullum P E, Yan Z, Bourret E, van Helvoort A T J, Selbach S M, Meier D

机构信息

Department of Materials Science and Engineering, NTNU Norwegian University of Science and Technology, 7491, Trondheim, Norway.

Department of Physics, NTNU Norwegian University of Science and Technology, 7491, Trondheim, Norway.

出版信息

Nat Commun. 2022 Aug 15;13(1):4783. doi: 10.1038/s41467-022-32189-0.

Abstract

The physical properties of semiconductors are controlled by chemical doping. In oxide semiconductors, small variations in the density of dopant atoms can completely change the local electric and magnetic responses caused by their strongly correlated electrons. In lightly doped systems, however, such variations are difficult to determine as quantitative 3D imaging of individual dopant atoms is a major challenge. We apply atom probe tomography to resolve the atomic sites that donors occupy in the small band gap semiconductor Er(Mn,Ti)O with a nominal Ti concentration of 0.04 at. %, map their 3D lattice positions, and quantify spatial variations. Our work enables atomic-level 3D studies of structure-property relations in lightly doped complex oxides, which is crucial to understand and control emergent dopant-driven quantum phenomena.

摘要

半导体的物理性质由化学掺杂控制。在氧化物半导体中,掺杂原子密度的微小变化会完全改变由其强关联电子引起的局部电响应和磁响应。然而,在轻掺杂系统中,由于对单个掺杂原子进行定量三维成像面临重大挑战,此类变化难以确定。我们应用原子探针断层扫描技术来解析施主在标称钛浓度为0.04原子百分比的小带隙半导体Er(Mn,Ti)O中占据的原子位置,绘制其三维晶格位置,并量化空间变化。我们的工作能够对轻掺杂复杂氧化物中的结构-性质关系进行原子级三维研究,这对于理解和控制新兴的掺杂剂驱动量子现象至关重要。

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