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基于MOCVD生长的二维层状GeSe的范德华异质结构器件的大内存窗口

Large Memory Window of van der Waals Heterostructure Devices Based on MOCVD-Grown 2D Layered Ge Se.

作者信息

Noh Gichang, Song Hwayoung, Choi Heenang, Kim Mingyu, Jeong Jae Hwan, Lee Yongjoon, Choi Min-Yeong, Oh Saeyoung, Jo Min-Kyung, Woo Dong Yeon, Jo Yooyeon, Park Eunpyo, Moon Eoram, Kim Tae Soo, Chai Hyun-Jun, Huh Woong, Lee Chul-Ho, Kim Cheol-Joo, Yang Heejun, Song Senugwoo, Jeong Hu Young, Kim Yong-Sung, Lee Gwan-Hyoung, Lim Jongsun, Kim Chang Gyoun, Chung Taek-Mo, Kwak Joon Young, Kang Kibum

机构信息

Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Korea.

Center for Neuromorphic Engineering, Korea Institute Science and Technology (KIST), Seoul, 02792, Korea.

出版信息

Adv Mater. 2022 Oct;34(41):e2204982. doi: 10.1002/adma.202204982. Epub 2022 Sep 9.

DOI:10.1002/adma.202204982
PMID:36000232
Abstract

Van der Waals (vdW) heterostructures have drawn much interest over the last decade owing to their absence of dangling bonds and their intriguing low-dimensional properties. The emergence of 2D materials has enabled the achievement of significant progress in both the discovery of physical phenomena and the realization of superior devices. In this work, the group IV metal chalcogenide 2D-layered Ge Se is introduced as a new selection of insulating vdW material. 2D-layered Ge Se is synthesized with a rectangular shape using the metalcorganic chemical vapor deposition system using a liquid germanium precursor at 240 °C. By stacking the Ge Se and MoS , vdW heterostructure devices are fabricated with a giant memory window of 129 V by sweeping back gate range of ±80 V. The gate-independent decay time reveals that the large hysteresis is induced by the interfacial charge transfer, which originates from the low band offset. Moreover, repeatable conductance changes are observed over the 2250 pulses with low non-linearity values of 0.26 and 0.95 for potentiation and depression curves, respectively. The energy consumption of the MoS /Ge Se device is about 15 fJ for operating energy and the learning accuracy of image classification reaches 88.3%, which further proves the great potential of artificial synapses.

摘要

在过去十年中,范德华(vdW)异质结构因其不存在悬空键以及引人入胜的低维特性而备受关注。二维材料的出现使得在物理现象的发现和高性能器件的实现方面都取得了重大进展。在这项工作中,引入了第IV族金属硫族化物二维层状GeSe作为绝缘范德华材料的新选择。二维层状GeSe在240°C下使用液态锗前驱体通过金属有机化学气相沉积系统合成成矩形。通过堆叠GeSe和MoS,通过扫描±80V的背栅范围制造出具有129V巨大记忆窗口的范德华异质结构器件。与栅极无关的衰减时间表明,大的滞后现象是由界面电荷转移引起的,这源于低带隙偏移。此外,在2250个脉冲中观察到可重复的电导变化,对于增强和抑制曲线,其低非线性值分别为0.26和0.95。MoS/GeSe器件的运行能量消耗约为15fJ,图像分类的学习准确率达到88.3%,这进一步证明了人工突触的巨大潜力。

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