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用于通过光学和纳米压印光刻对各种(性质和形状的)衬底进行微结构化的多功能氧化锆(ZrO)溶胶-凝胶开发。

Versatile Zirconium Oxide (ZrO) Sol-Gel Development for the Micro-Structuring of Various Substrates (Nature and Shape) by Optical and Nano-Imprint Lithography.

作者信息

Crespo-Monteiro Nicolas, Valour Arnaud, Vallejo-Otero Victor, Traynar Marie, Reynaud Stéphanie, Gamet Emilie, Jourlin Yves

机构信息

Université de Lyon, Université Jean-Monnet-Saint Etienne, Laboratoire Hubert Curien, UMR CNRS 5516, 42000 Saint-Etienne, France.

出版信息

Materials (Basel). 2022 Aug 15;15(16):5596. doi: 10.3390/ma15165596.

DOI:10.3390/ma15165596
PMID:36013735
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9414744/
Abstract

Zirconium oxide (ZrO) is a well-studied and promising material due to its remarkable chemical and physical properties. It is used, for example, in coatings for corrosion protection layer, wear and oxidation, in optical applications (mirror, filters), for decorative components, for anti-counterfeiting solutions and for medical applications. ZrO can be obtained as a thin film using different deposition methods such as physical vapor deposition (PVD) or chemical vapor deposition (CVD). These techniques are mastered but they do not allow easy micro-nanostructuring of these coatings due to the intrinsic properties (high melting point, mechanical and chemical resistance). An alternative approach described in this paper is the sol-gel method, which allows direct micro-nanostructuring of the ZrO layers without physical or chemical etching processes, using optical or nano-imprint lithography. In this paper, the authors present a complete and suitable ZrO sol-gel method allowing to achieve complex micro-nanostructures by optical or nano-imprint lithography on substrates of different nature and shape (especially non-planar and foil-based substrates). The synthesis of the ZrO sol-gel is presented as well as the micro-nanostructuring process by masking, colloidal lithography and nano-imprint lithography on glass and plastic substrates as well as on plane and curved substrates.

摘要

氧化锆(ZrO)因其卓越的化学和物理性质而成为一种经过充分研究且颇具前景的材料。例如,它被用于防腐涂层、耐磨和抗氧化涂层、光学应用(镜子、滤光片)、装饰部件、防伪解决方案以及医疗应用。可以使用不同的沉积方法,如物理气相沉积(PVD)或化学气相沉积(CVD)来获得ZrO薄膜。这些技术已被掌握,但由于其固有特性(高熔点、机械和化学抗性),它们无法轻松实现这些涂层的微纳结构化。本文描述的一种替代方法是溶胶 - 凝胶法,该方法允许在不进行物理或化学蚀刻工艺的情况下,使用光学或纳米压印光刻技术直接对ZrO层进行微纳结构化。在本文中,作者提出了一种完整且适用的ZrO溶胶 - 凝胶法,该方法能够通过光学或纳米压印光刻技术在不同性质和形状(特别是非平面和箔基基板)的基板上实现复杂的微纳结构。文中还介绍了ZrO溶胶 - 凝胶的合成过程以及通过掩膜、胶体光刻和纳米压印光刻技术在玻璃和塑料基板以及平面和曲面基板上进行微纳结构化的过程。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/b8827e9c8f60/materials-15-05596-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/31bd47206f43/materials-15-05596-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/95037cad1f8a/materials-15-05596-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/ee02679668c8/materials-15-05596-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/2135f43d1434/materials-15-05596-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/b8827e9c8f60/materials-15-05596-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/31bd47206f43/materials-15-05596-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/95037cad1f8a/materials-15-05596-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/ee02679668c8/materials-15-05596-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/2135f43d1434/materials-15-05596-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2697/9414744/b8827e9c8f60/materials-15-05596-g007.jpg

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