Zhao Tingwen, Wang Shuhao, Li Yibing, Jia Chen, Su Zhen, Hao Derek, Ni Bing-Jie, Zhang Qiang, Zhao Chuan
School of Chemistry, The University of New South Wales, Sydney, New South Wales, 2052, Australia.
Institute of Smart City and Intelligent Transportation, Southwest Jiaotong University, Chengdu, 610097, China.
Small. 2022 Oct;18(40):e2204758. doi: 10.1002/smll.202204758. Epub 2022 Sep 4.
Regulating the electronic structure and intrinsic activity of catalysts' active sites with optimal hydrogen intermediates adsorption is crucial to enhancing the hydrogen evolution reaction (HER) in alkaline media. Herein, a heterostructured V-doped Ni P/Ni P (V-Ni P/Ni P ) electrocatalyst is fabricated through a hydrothermal treatment and controllable phosphidation process. In comparison with pure-phase V-Ni P, in/ex situ characterizations and theoretical calculations reveal a redistribution of electrons and active sites in V-Ni P/Ni P due to the V doping and heterointerfaces effect. The strong coupling between Ni P and Ni P at the interface leads to an increased electron density at interfacial Ni sites while depleting at P sites, with V-doping further promoting the electron accumulation at Ni sites. This is accompanied by the change of active sites from the anionic P sites to the interfacial Ni-V bridge sites in V-Ni P/Ni P . Benefiting from the interface electronic structure, increased number of active sites, and optimized H-adsorption energy, the V-Ni P/Ni P exhibits an overpotential of 62 mV to deliver 10 mA cm and excellent long-term stability for HER. The V-Ni P/Ni P catalyst is applied for anion exchange membrane water electrolysis to deliver superior performance with a current density of 500 mA cm at a cell voltage of 1.79 V and excellent durability.
通过优化氢中间体吸附来调节催化剂活性位点的电子结构和本征活性,对于增强碱性介质中的析氢反应(HER)至关重要。在此,通过水热处理和可控磷化过程制备了一种异质结构的V掺杂NiP/NiP(V-NiP/NiP)电催化剂。与纯相V-NiP相比,原位/非原位表征和理论计算表明,由于V掺杂和异质界面效应,V-NiP/NiP中的电子和活性位点发生了重新分布。界面处NiP和NiP之间的强耦合导致界面Ni位点处的电子密度增加,而P位点处的电子密度降低,V掺杂进一步促进了Ni位点处的电子积累。这伴随着V-NiP/NiP中活性位点从阴离子P位点转变为界面Ni-V桥位点。受益于界面电子结构、活性位点数量的增加以及优化的H吸附能,V-NiP/NiP在提供10 mA cm时的过电位为62 mV,并且对HER具有优异的长期稳定性。V-NiP/NiP催化剂应用于阴离子交换膜水电解,在1.79 V的电池电压下以500 mA cm的电流密度提供优异的性能和出色的耐久性。