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单层和体相硫化镓的载流子迁移率:基于第一性原理计算

The carrier mobility of monolayer and bulk GaS: from first-principles calculations.

作者信息

Wang Jiangnan, Zhang Ruijie, Xiao Huagang, Zhou Runyu, Gao Tao

机构信息

Institute of Atomic and Molecular Physics, Sichuan University, Chengdu, 610065, China.

出版信息

Phys Chem Chem Phys. 2022 Sep 21;24(36):21666-21673. doi: 10.1039/d2cp02614g.

Abstract

Metal chalcogenides have become popular materials for next-generation electronic devices due to their wide band gap and excellent transport properties. Specifically, two-dimensional metal chalcogenides also have outstanding physical properties. For electronic devices, the carrier mobility is a key parameter because it affects the material conductivity and the response time. As a member of metal chalcogenides, GaS has attracted the attention of scholars. In this work, by using first principles calculations and the Wannier function interpolation, the electronic and phonon properties, the electron-phonon interaction, the scattering rate, and the carrier mobility of monolayer and bulk GaS are systematically studied. The results show that GaS is a semiconductor and both monolayer and bulk GaS are dynamically stable. The LO phonon modes at long wavelengths strongly affect the carrier migration in GaS. We give the carrier mobility of monolayer and bulk GaS as a function of temperature (100 < K < 500). In addition, we compare the carrier mobility of GaS with several other metal chalcogenides (monolayer and bulk InSe, monolayer GeS, and monolayer GeSe) at 300 K. The results show that an increase in temperature leads to a decrease in the carrier mobility and the electron (hole) mobility of monolayer and bulk GaS is 10.85 cm V s (0.22 cm V s) and 1229.79 cm V s (9.28 cm V s), respectively. By comparing with the carrier mobility of other chalcogenides, we can find that the electron mobility of bulk GaS is the highest, which indicates that bulk GaS has high application potential.

摘要

金属硫族化物因其宽带隙和优异的传输性能,已成为下一代电子器件的热门材料。具体而言,二维金属硫族化物还具有出色的物理性质。对于电子器件来说,载流子迁移率是一个关键参数,因为它会影响材料的电导率和响应时间。作为金属硫族化物的一员,硫化镓(GaS)已引起学者们的关注。在这项工作中,通过使用第一性原理计算和万尼尔函数插值法,系统地研究了单层和体相GaS的电子和声子性质、电子 - 声子相互作用、散射率以及载流子迁移率。结果表明,GaS是一种半导体,单层和体相GaS都是动态稳定的。长波长处的LO声子模对GaS中的载流子迁移有强烈影响。我们给出了单层和体相GaS的载流子迁移率随温度(100 < K < 500)的变化关系。此外,我们比较了GaS与其他几种金属硫族化物(单层和体相InSe、单层GeS以及单层GeSe)在300 K时的载流子迁移率。结果表明,温度升高会导致载流子迁移率降低,单层和体相GaS的电子(空穴)迁移率分别为10.85 cm² V⁻¹ s⁻¹(0.22 cm² V⁻¹ s⁻¹)和1229.79 cm² V⁻¹ s⁻¹(9.28 cm² V⁻¹ s⁻¹)。通过与其他硫族化物的载流子迁移率进行比较,我们发现体相GaS的电子迁移率最高,这表明体相GaS具有很高的应用潜力。

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