Guo Pengsheng, Liang Jia, Zhou Benliang, Wang Weike, Liu Ziran
Department of Physics and Key Laboratory for Low-Dimensional Structures and Quantum Manipulation (Ministry of Education), Hunan Normal University, Changsha 410081, People's Republic of China.
Key Laboratory for Matter Microstructure and Function of Hunan Province, Hunan Normal University, Changsha 410081, People's Republic of China.
J Phys Condens Matter. 2020 May 15;32(32). doi: 10.1088/1361-648X/ab808f.
Layered ZrGeTeis a new type of ternary anisotropic semiconductor. The strong in-plane anisotropy may give us another degree of freedom for controlling electrical and optical properties, and designing advanced nanodevices. Using first-principles calculations, physical properties such as band structure, phonon vibration, and carrier mobility of layered ZrGeTefrom bulk to monolayer were investigated. The bulk and few-layer ZrGeTeare predicted as indirect bandgap semiconductors, but the monolayer ZrGeTeturns out to be a direct band gap semiconductor with moderate value of 1.08 eV. Electronic structure calculations reveal that the van der Waals interaction is the main reason of causing the transition from indirect band gap to direct one. Phonon calculations demonstrate that the layered ZrGeTeis mechanically stable and anisotropic. In orders of magnitude, the predicted average carrier mobility of ZrGeTe(∼10cmVs) is between that of graphene (∼10) and MoS(∼10), and the anisotropy of electronic mobility is similar to that of black phosphorus, while hole mobility varies with the numbers of layers.
层状ZrGeTe是一种新型的三元各向异性半导体。其强面内各向异性可能为我们控制电学和光学性质以及设计先进纳米器件提供另一个自由度。利用第一性原理计算,研究了从体相到单层的层状ZrGeTe的诸如能带结构、声子振动和载流子迁移率等物理性质。体相和少层ZrGeTe被预测为间接带隙半导体,但单层ZrGeTe却是具有1.08 eV适中值的直接带隙半导体。电子结构计算表明,范德华相互作用是导致从间接带隙向直接带隙转变的主要原因。声子计算表明,层状ZrGeTe在力学上是稳定的且具有各向异性。在数量级上,预测的ZrGeTe平均载流子迁移率(10 cm²V⁻¹s⁻¹)介于石墨烯(10⁴ cm²V⁻¹s⁻¹)和MoS₂(~10² cm²V⁻¹s⁻¹)之间,并且电子迁移率的各向异性与黑磷相似,而空穴迁移率随层数变化。