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二维Janus XMoGeN(X = S、Se和Te)材料的第一性原理预测

First principles prediction of two-dimensional Janus XMoGeN (X = S, Se and Te) materials.

作者信息

Nguyen Son-Tung, Cuong Pham V, Cuong Nguyen Q, Nguyen Chuong V

机构信息

Faculty of Electrical Engineering, Hanoi University of Industry, Hanoi 100000, Vietnam.

Institute of Research and Development, Duy Tan University, Da Nang 550000, Vietnam.

出版信息

Dalton Trans. 2022 Sep 26;51(37):14338-14344. doi: 10.1039/d2dt02222b.

Abstract

Motivated by the successful synthesis of two-dimensional MoSiN [Y.-L. Hong , , 2020, , 670-674] and Janus MoSSe [A.-Y. Lu , , 2017, , 744-749], in this work, we propose novel 2D Janus XMoGeN (X = S, Se and Te) monolayers using first-principles prediction. The controllable electronic features of Janus XMoGeN (X = S, Se and Te) monolayers under an external electric field and strain are also examined. Our predictions demonstrated that 2D XMoGeN materials are structurally and dynamically stable. All these 2D XMoGeN materials are indirect semiconductors with band gaps of 1.60/2.10, 1.54/2.07 and 1.05/1.56 eV obtained by the PBE/HSE functional for SMoGeN, SeMoGeN and TeMoGeN monolayers, respectively. Furthermore, the electronic band gap and band structures of these monolayers are controllable under an external electric field and strain, making them promising candidates for flexible optoelectronics and nanoelectronics. The electric field tunes the TeMoGeN monolayer from semiconductor to metal and leads to a change in the band gap. While strain modifies the band gap of the TeMoGeN monolayer, giving rise to a shift in the CB from the Γ-M path to the M point and a tendency to transform from semiconductor to metal. Our findings suggest that these novel 2D XMoGeN materials are potential candidates for use in future high-performance applications.

摘要

受二维MoSiN [Y.-L. Hong, , 2020, , 670 - 674]和Janus MoSSe [A.-Y. Lu, , 2017, , 744 - 749]成功合成的启发,在本工作中,我们使用第一性原理预测提出了新型二维Janus XMoGeN(X = S、Se和Te)单层材料。还研究了Janus XMoGeN(X = S、Se和Te)单层材料在外部电场和应变下的可控电子特性。我们的预测表明,二维XMoGeN材料在结构和动力学上是稳定的。所有这些二维XMoGeN材料都是间接半导体,通过PBE/HSE泛函分别得到SMoGeN、SeMoGeN和TeMoGeN单层的带隙为1.60/2.10、1.54/2.07和1.05/1.56 eV。此外,这些单层材料的电子带隙和能带结构在外部电场和应变下是可控的,这使其成为柔性光电子学和纳米电子学的有前途的候选材料。电场将TeMoGeN单层从半导体调制成金属,并导致带隙发生变化。而应变改变了TeMoGeN单层的带隙,使导带从Γ - M路径向M点移动,并呈现出从半导体转变为金属的趋势。我们的研究结果表明,这些新型二维XMoGeN材料是未来高性能应用的潜在候选材料。

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