Department of Physics, Yunnan University, Kunming 650091, People's Republic of China.
Materials Genome Institute, School of Materials and Energy, Yunnan University, Kunming 650091, P. R. China.
Dalton Trans. 2023 Jun 20;52(24):8322-8331. doi: 10.1039/d3dt00813d.
Since the successful experimental synthesis of MoSiN, the "MAZ family" has attracted the interest of researchers from many fields due to its excellent physical and chemical properties. In this work, we propose a novel two-dimensional Janus STiXY (X = Si, Ge; Y = N, P, As) monolayer using first principles. Under biaxial strain and an applied electric field, we investigate the controllable electronic properties of Janus STiXY (X = Si, Ge; Y = N, P, As) structures. Our predictions demonstrate that the 2D STiXY materials are structurally and dynamically stable. Using the HSE functional, we show that these 2D STiXY materials are indirect semiconductors with band gaps of 0.99, 1.142, 0.834, 1.322, 0.735, and 0.215 eV, respectively. Additionally, we found that, except for the STiXAs (X = Si, Ge) monolayer, the influence of biaxial strain on electronic characteristics is significantly greater than that of the applied electric field. Finally, we calculated the carrier mobilities of these Janus structures and found that the STiGeP monolayer has the highest electron carrier mobility in the -direction with 8175.66 cm s V, while the STiGeAs monolayer has the highest electron carrier mobility in the -direction, 2897.94 cm s V. They are all larger than those of the experimentally synthesized MoS (∼200 cm s V). The results may provide insights for the study of novel Janus monolayers with potential application in electronic devices.
自 MoSiN 的成功实验合成以来,由于其优异的物理和化学性质,“MAZ 家族”引起了许多领域研究人员的兴趣。在这项工作中,我们使用第一性原理提出了一种新颖的二维 Janus STiXY(X = Si、Ge;Y = N、P、As)单层。在双轴应变和外加电场下,我们研究了 Janus STiXY(X = Si、Ge;Y = N、P、As)结构的可控电子性质。我们的预测表明,二维 STiXY 材料在结构和动力学上都是稳定的。使用 HSE 泛函,我们表明这些二维 STiXY 材料是间接半导体,带隙分别为 0.99、1.142、0.834、1.322、0.735 和 0.215 eV。此外,我们发现,除了 STiXAs(X = Si、Ge)单层之外,双轴应变对电子特性的影响明显大于外加电场的影响。最后,我们计算了这些 Janus 结构的载流子迁移率,发现 STiGeP 单层在 - 方向上具有最高的电子载流子迁移率,为 8175.66 cm s V,而 STiGeAs 单层在 - 方向上具有最高的电子载流子迁移率,为 2897.94 cm s V。它们都大于实验合成的 MoS(约 200 cm s V)。这些结果可能为具有潜在应用于电子器件的新型 Janus 单层的研究提供了一些启示。