Qu Ting, Guan Song, Zheng Xiaoxiong, Chen Aihua
School of Materials Science and Engineering, Beihang University Beijing 100191 P. R. China
Nanoscale Adv. 2020 Mar 4;2(4):1523-1530. doi: 10.1039/d0na00057d. eCollection 2020 Apr 15.
The highly ordered perpendicularly aligned cylindrical and lamellar microdomains within block copolymer (BCP) films have important applications in diverse fields. However, the fast normal orientation of self-assembled nanostructures on arbitrary substrates without tedious pre- and postprocessing has been a challenging issue in manufacturing miniaturized devices. Here, we outline the potential for extending the hierarchical self-assembly within azobenzene-containing PS--PMA(Az) films to inherently assist in the formation of normally aligned domains using a rapid thermal annealing process (140 °C for 5 min). Liquid crystalline (LC) mesogens in PS--PMA(Az) films self-assemble to form a parallelly aligned sematic phase after thermal annealing, as confirmed by grazing-incidence small-angle X-ray scattering (GISAXS), wide-angle X-ray diffraction (WAXD) and ultraviolet-visible (UV-vis) spectra. This sub-phase contributes to broadening of the PS-cylinder-phase window (0.083 ≤ < 0.49) and ∼12 nm PS cylinder structures. Perpendicular cylinders or lamellae are observed on various substrates, such as silicon wafers, flexible polyethylene terephthalate (PET) sheets and conductive aluminum foils. Additionally, the good reactive ion etching (RIE) rate difference between the two blocks makes these BCPs more attractive for advancing the field of BCP lithographic applications for fabricating flexible microelectronic devices.
嵌段共聚物(BCP)薄膜中高度有序的垂直排列的圆柱形和层状微区在多个领域具有重要应用。然而,在不进行繁琐的预处理和后处理的情况下,使自组装纳米结构在任意衬底上快速垂直取向,一直是制造小型化器件中的一个具有挑战性的问题。在此,我们概述了利用快速热退火工艺(140℃,5分钟)扩展含偶氮苯的聚苯乙烯-聚甲基丙烯酸甲酯(PS-PMA(Az))薄膜中的分级自组装以固有地协助形成垂直排列微区的潜力。掠入射小角X射线散射(GISAXS)、广角X射线衍射(WAXD)和紫外-可见(UV-vis)光谱证实,PS-PMA(Az)薄膜中的液晶(LC)介晶在热退火后自组装形成平行排列的向列相。该亚相对拓宽PS圆柱相窗口(0.083≤ <0.49)和形成约12nm的PS圆柱结构有贡献。在各种衬底上,如硅片、柔性聚对苯二甲酸乙二酯(PET)片和导电铝箔上,均观察到了垂直圆柱或薄片。此外,两个嵌段之间良好的反应离子蚀刻(RIE)速率差异,使得这些BCP在推进用于制造柔性微电子器件的BCP光刻应用领域方面更具吸引力。