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使用新型氧化石墨烯功能化的UiO-66-NDC纳米复合材料对水环境中砷的吸附和去除进行的系统研究。

A systematic study of arsenic adsorption and removal from aqueous environments using novel graphene oxide functionalized UiO-66-NDC nanocomposites.

作者信息

Singh Simranjeet, Naik T S Sunil Kumar, U Basavaraju, Khan Nadeem A, Wani Abdul Basit, Behera Sushant Kumar, Nath Bidisha, Bhati Shipra, Singh Joginder, Ramamurthy Praveen C

机构信息

Interdisciplinary Centre for Water Research (ICWaR), Indian Institute of Science, Bangalore, India.

Department of Materials Engineering, Indian Institute of Science, Bangalore, India.

出版信息

Sci Rep. 2022 Sep 22;12(1):15802. doi: 10.1038/s41598-022-18959-2.

Abstract

This study investigates the removal of As(V) from aqueous media using water stable UiO-66-NDC/GO prepared via the solvothermal procedure. The synthesized material was analyzed by Raman spectroscopy, UV-visible, X-ray powder diffraction (XRD), Transmission electron microscopy (TEM), Fourier Transform Infrared spectroscopy (ATR-FTIR), scanning electron microscopy (SEM), and Brunauer-Emmett-Teller (BET) support its applicability as a super-adsorbent for the adsorption of As(V) ions from aqueous solutions. The effect of various parameters, including initial ion concentration, temperature, adsorbent dose, and pH on the adsorption of As(V) was studied to recognize the optimum adsorption conditions. The q obtained for this study using Langmuir isotherms was found at 147.06 mg/g at room temperature. Thermodynamic parameters ΔH°, ΔG°, and ΔS° were also calculated and negative values of ΔG° represent that the As(V) adsorption process occurred exothermically and spontaneously. Meanwhile, theoretical density functional simulation findings are accommodated to support these experimental results. It is observed that the dynamic nature of graphene oxide and the UiO-66 NDC nanocomposite system becomes superior for adsorption studies due to delocalized surface states. UiO-66-NDC/GO also showed high reusability for up four regeneration performances using 0.01 M HCl as a regenerant.

摘要

本研究考察了通过溶剂热法制备的水稳定型UiO-66-NDC/GO对水相中五价砷(As(V))的去除效果。采用拉曼光谱、紫外可见光谱、X射线粉末衍射(XRD)、透射电子显微镜(TEM)、傅里叶变换红外光谱(ATR-FTIR)、扫描电子显微镜(SEM)和布鲁诺尔-埃米特-泰勒(BET)对合成材料进行分析,以支持其作为从水溶液中吸附As(V)离子的超级吸附剂的适用性。研究了初始离子浓度、温度、吸附剂剂量和pH值等各种参数对As(V)吸附的影响,以确定最佳吸附条件。本研究使用朗缪尔等温线在室温下获得的q值为147.06 mg/g。还计算了热力学参数ΔH°、ΔG°和ΔS°,ΔG°的负值表明As(V)吸附过程是放热且自发进行的。同时,采用理论密度泛函模拟结果来支持这些实验结果。观察到由于表面态的离域化,氧化石墨烯和UiO-66 NDC纳米复合体系的动力学性质在吸附研究中表现优异。UiO-66-NDC/GO使用0.01 M HCl作为再生剂,在高达四次再生性能测试中也显示出高可重复使用性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/deed/9500003/97ec94bad3cf/41598_2022_18959_Fig1_HTML.jpg

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