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用于透明热电材料的Zr夹芯ZnO薄膜的原子层沉积

Atomic layer deposition of Zr-sandwiched ZnO thin films for transparent thermoelectrics.

作者信息

Koskinen Tomi, Volin Ulrika, Tossi Camilla, Raju Ramesh, Tittonen Ilkka

机构信息

Department of Electronics and Nanoengineering, Aalto University, PO Box FI-13500, Finland.

Current address: Center for Nanotechnology Innovation @ NEST, Istituto Italiano di Tecnologia, Piazza San Silvestro 12, I-56127, Pisa, Italy.

出版信息

Nanotechnology. 2022 Nov 4;34(3). doi: 10.1088/1361-6528/ac9980.

Abstract

Atomic layer deposited (ALD) transparent thermoelectric materials enable the introduction of energy harvesting and sensing devices onto surfaces of various shapes and sizes in imperceptible manner. Amongst these materials, ZnO has shown promising results in terms of both thermoelectric and optical characteristics. The thermoelectric performance of ZnO can be further optimized by introducing extrinsic doping, to the realization of which ALD provides excellent control. Here, we explore the effects of sandwiching of ZrOlayers with ZnO on glass substrates. The room-temperature thermoelectric power factor is maximised at 116μW mKwith samples containing a 2% nominal percentage of ZrO. The addition of ZrOlayers is further shown to reduce the thermal conductivity, resulting in a 20.2% decrease from the undoped ZnO at 2% doping. Our results contribute to increasing the understanding of the effects of Zr inclusion in structural properties and growth of ALD ZnO, as well as the thermal and thermoelectric properties of Zr-doped ZnO films in general.

摘要

原子层沉积(ALD)透明热电材料能够以不可察觉的方式将能量收集和传感装置引入各种形状和尺寸的表面。在这些材料中,ZnO在热电和光学特性方面都显示出了有前景的结果。通过引入非本征掺杂可以进一步优化ZnO的热电性能,而ALD为实现这一点提供了出色的控制。在此,我们探索在玻璃基板上用ZrO层与ZnO夹层的效果。对于含有2%标称百分比ZrO的样品,室温热电功率因数在116μW mK时达到最大值。进一步表明,添加ZrO层会降低热导率,在2%掺杂时,与未掺杂的ZnO相比降低了20.2%。我们的结果有助于增进对Zr掺入对ALD ZnO结构性能和生长的影响以及一般情况下Zr掺杂ZnO薄膜的热性能和热电性能的理解。

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