Rubner Jens, Skribbe Soukaina, Roth Hannah, Kleines Lara, Dahlmann Rainer, Wessling Matthias
Chemical Process Engineering AVT.CVT, RWTH Aachen University, Forckenbeckstraße 51, 52074 Aachen, Germany.
DWI-Leibniz-Institute for Interactive Materials, Forckenbeckstraße 50, 52074 Aachen, Germany.
Membranes (Basel). 2022 Oct 13;12(10):994. doi: 10.3390/membranes12100994.
Selective, nanometer-thin organosilica layers created by plasma-enhanced chemical vapor deposition (PECVD) exhibit selective gas permeation behavior. Despite their promising pure gas performance, published data with regard to mixed gas behavior are still severely lacking. This study endeavors to close this gap by investigating the pure and mixed gas behavior depending on temperatures from 0 °C to 60 °C for four gases (helium, methane, carbon dioxide, and nitrogen) and water vapor. For the two permanent gases, helium and methane, the studied organosilica membrane shows a substantial increase in selectivity from α = 9 at 0 °C to α = 40 at 60 °C for pure as well as mixed gases with helium permeance of up to 300 GPU. In contrast, a condensable gas such as CO leads to a decrease in selectivity and an increase in permeance compared to its pure gas performance. When water vapor is present in the feed gas, the organosilica membrane shows even stronger deviations from pure gas behavior with a permeance loss of about 60 % accompanied by an increase in ideal selectivity α from 8 to 13. All in all, the studied organosilica membrane shows very promising results for mixed gases. Especially for elevated temperatures, there is a high potential for separation by size exclusion.
通过等离子体增强化学气相沉积（PECVD）制备的选择性纳米级有机硅层表现出选择性气体渗透行为。尽管它们在纯气体性能方面很有前景，但关于混合气体行为的已发表数据仍然严重缺乏。本研究旨在通过研究四种气体（氦气、甲烷、二氧化碳和氮气）以及水蒸气在0°C至60°C温度范围内的纯气体和混合气体行为来填补这一空白。对于两种永久性气体氦气和甲烷，所研究的有机硅膜在0°C时选择性α = 9，在60°C时对于纯气体和混合气体的选择性α = 40有显著增加，氦气渗透率高达300 GPU。相比之下，与纯气体性能相比，像二氧化碳这样的可凝性气体导致选择性降低和渗透率增加。当原料气中存在水蒸气时，有机硅膜与纯气体行为的偏差更大，渗透率损失约60%，同时理想选择性α从8增加到13。总体而言，所研究的有机硅膜对混合气体显示出非常有前景的结果。特别是在高温下，通过尺寸排阻进行分离具有很大潜力。
