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一种用于在g-CN上高度分散镍原子以促进CO光还原的球磨法。

A ball milling method for highly dispersed Ni atoms on g-CN to boost CO photoreduction.

作者信息

Tang Ruofei, Wang Hong, Dong Xing'an, Zhang Shihan, Zhang Lili, Dong Fan

机构信息

Research Center for Environmental and Energy Catalysis, Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China, Chengdu 611731, China.

Key Laboratory of Microbial Technology for Industrial Pollution Control of Zhejiang Province, College of Environment, Zhejiang University of Technology, Hangzhou 310014, China.

出版信息

J Colloid Interface Sci. 2023 Jan 15;630(Pt B):290-300. doi: 10.1016/j.jcis.2022.10.110. Epub 2022 Oct 27.

Abstract

Atomically dispersed active sites can effectively enhance the catalytic activity, but the synthesis of highly dispersed single-atom active sites remains challenging. Herein, we report for the fabrication of single-atom Ni on g-CN (CN) catalysts for photocatalytic CO reduction reaction (CORR) using a high-energy ball milling method. The uniformly loaded single-atomic Ni on the surface of the substrate suggests the improvement of synthetic methods. After optimizing the Ni loading, the photocatalyst containing 0.5 at% (0.32 wt%) single-atomic Ni (Ni/CN-0.5) exhibited the highest CO reduction performance (∼19.9 μmol·g·h) without any co-catalyst or sacrificial agent. As visualized by aberration-corrected high-angle annular darkfield scanning transmission electron microscopy (AC HAADF-STEM), the Ni atoms in the Ni/CN-0.5 photocatalyst are most uniformly dispersed for different loadings (0.1, 0.3, 0.5, 0.7, 1.0, 3.0 and 5.0 at%). These results suggest that the uniformity of the single-atom active sites plays a decisive role rather than the loading amount in the highly enhanced performance. This work provides insight into the design of photocatalysts with highly dispersed single-atom catalytic active sites for enhancing activity.

摘要

原子级分散的活性位点可有效提高催化活性,但高分散单原子活性位点的合成仍然具有挑战性。在此,我们报道了一种使用高能球磨法制备用于光催化CO还原反应(CORR)的g-CN(CN)催化剂上单原子Ni的方法。基底表面均匀负载的单原子Ni表明合成方法有所改进。优化Ni负载量后,含有0.5 at%(0.32 wt%)单原子Ni的光催化剂(Ni/CN-0.5)在没有任何助催化剂或牺牲剂的情况下表现出最高的CO还原性能(约19.9 μmol·g·h)。通过像差校正高角度环形暗场扫描透射电子显微镜(AC HAADF-STEM)观察发现,对于不同负载量(0.1、0.3、0.5、0.7、1.0、3.0和5.0 at%),Ni/CN-0.5光催化剂中的Ni原子分散最为均匀。这些结果表明,在性能大幅提高方面,单原子活性位点的均匀性而非负载量起着决定性作用。这项工作为设计具有高分散单原子催化活性位点以提高活性的光催化剂提供了思路。

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