Wolf Nathan R, Jaffe Adam, Slavney Adam H, Mao Wendy L, Leppert Linn, Karunadasa Hemamala I
Department of Chemistry, Stanford University, Stanford, California94305, United States.
Department of Geological Sciences, Stanford University, Stanford, California94305, United States.
J Am Chem Soc. 2022 Nov 16;144(45):20763-20772. doi: 10.1021/jacs.2c08607. Epub 2022 Nov 7.
Dopant defects in semiconductors can trap charge carriers or ionize to produce charge carriers─playing a critical role in electronic transport. Halide perovskites are a technologically important semiconductor family with a large pressure response. Yet, to our knowledge, the effect of high pressures on defects in halide perovskites has not been experimentally investigated. Here, we study the structural, optical, and electronic consequences of compressing the small-bandgap double perovskites CsAgTlX (X = Cl or Br) up to 56 GPa. Mild compression to 1.7 GPa increases the conductivity of CsAgTlBr by ca. 1 order of magnitude and decreases its bandgap from 0.94 to 0.7 eV. Subsequent compression yields complex optoelectronic behavior: the bandgap varies by 1.2 eV and conductivity ranges by a factor of 10. These conductivity changes cannot be explained by the evolving bandgap. Instead, they can be understood as tuning of the bromine vacancy defect with pressure─varying between a delocalized shallow defect state with a small ionization energy and a localized deep defect state with a large ionization energy. Activation energy measurements reveal that the shallow-to-deep defect transition occurs near 1.5 GPa, well before the cubic-to-tetragonal phase transition. An analysis of the orbital interactions in CsAgTlBr illustrates how the bromine vacancy weakens the adjacent Tl s-Br p antibonding interaction, driving the shallow-to-deep defect transition. Our orbital analysis leads us to propose that halogen vacancies are most likely to be shallow donors in halide double perovskites that have a conduction band derived from the octahedral metal's s orbitals.
半导体中的掺杂剂缺陷可以捕获电荷载流子或电离以产生电荷载流子,这在电子输运中起着关键作用。卤化物钙钛矿是一类在技术上很重要的半导体家族,具有较大的压力响应。然而,据我们所知,高压对卤化物钙钛矿中缺陷的影响尚未得到实验研究。在这里,我们研究了将小带隙双钙钛矿CsAgTlX(X = Cl或Br)压缩至56 GPa时的结构、光学和电子效应。轻度压缩至1.7 GPa可使CsAgTlBr的电导率提高约1个数量级,并使其带隙从0.94 eV降至0.7 eV。随后的压缩产生了复杂的光电行为:带隙变化1.2 eV,电导率范围变化10倍。这些电导率变化无法用不断变化的带隙来解释。相反,它们可以理解为溴空位缺陷随压力的调整,在具有小电离能的离域浅缺陷态和具有大电离能的局域深缺陷态之间变化。活化能测量表明,浅到深的缺陷转变发生在1.5 GPa附近,远早于立方到四方的相变。对CsAgTlBr中轨道相互作用的分析说明了溴空位如何削弱相邻的Tl s-Br p反键相互作用,从而驱动浅到深的缺陷转变。我们的轨道分析使我们提出,在具有源自八面体金属s轨道的导带的卤化物双钙钛矿中,卤素空位最有可能是浅施主。