Sun Bo-Yao, Cheang Wai-Hong, Chou Shih-Cheng, Chiao Jung-Chih, Wu Pu-Wei
Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 300, Taiwan.
Department of Electrical and Computer Engineering, Southern Methodist University, Dallas, TX 75205, USA.
Nanomaterials (Basel). 2022 Oct 29;12(21):3829. doi: 10.3390/nano12213829.
A Cu micromembrane is successfully fabricated and validated as a porous flexible electrode. The Cu micromembrane is prepared by functionalizing individual polypropylene (PP) fibers in a polypropylene micromembrane (PPMM) using a mixture of polydopamine (PDA) and polyethyleneimine (PEI). The mixture of PDA and PEI provides adhesive, wetting, and reducing functionalities that facilitate subsequent Ag activation and Cu electroless plating. Scanning electron microscopy reveals conformal deposition of Cu on individual PP fibers. Porometer analysis indicates that the porous nature of PPMM is properly maintained. The Cu micromembrane demonstrates impressive electrical conductivities in both the X direction (1.04 ± 0.21 S/cm) and Z direction (2.99 ± 0.54 × 10 S/cm). In addition, its tensile strength and strain are better than those of pristine PPMM. The Cu micromembrane is flexible and mechanically robust enough to sustain 10,000 bending cycles with moderate deterioration. Thermogravimetric analysis shows a thermal stability of 400 °C and an effective Cu loading of 5.36 mg/cm. Cyclic voltammetric measurements reveal that the Cu micromembrane has an electrochemical surface area of 277.8 cm in a 1 cm geometric area (a roughness factor of 227.81), a value that is 45 times greater than that of planar Cu foil.
成功制备了一种铜微膜,并验证其为多孔柔性电极。铜微膜是通过使用聚多巴胺(PDA)和聚乙烯亚胺(PEI)的混合物对聚丙烯微膜(PPMM)中的单根聚丙烯(PP)纤维进行功能化处理而制备的。PDA和PEI的混合物提供了粘附、润湿和还原功能,有助于后续的银活化和铜化学镀。扫描电子显微镜显示铜在单根PP纤维上的保形沉积。孔隙率分析表明PPMM的多孔性质得到了适当保持。铜微膜在X方向(1.04±0.21 S/cm)和Z方向(2.99±0.54×10 S/cm)均表现出令人印象深刻的电导率。此外,其拉伸强度和应变优于原始PPMM。铜微膜具有柔韧性和机械强度,足以承受10000次弯曲循环且性能仅有适度下降。热重分析表明其热稳定性为400°C,有效铜负载量为5.36 mg/cm。循环伏安测量表明,在1 cm几何面积内,铜微膜的电化学表面积为277.8 cm(粗糙度因子为227.81),该值比平面铜箔大45倍。