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微接触印刷在 Au 模型衬底上获得的腐蚀抑制剂分子的横向非均匀薄膜的纳米机械稳定性。

Nanomechanical Stability of Laterally Heterogeneous Films of Corrosion Inhibitor Molecules Obtained by Microcontact Printing on Au Model Substrates.

机构信息

Institute for Materials Research, Hasselt University, Diepenbeek 3590, Belgium.

Division IMOMEC, IMEC vzw, Diepenbeek 3590, Belgium.

出版信息

Langmuir. 2022 Dec 20;38(50):15614-15621. doi: 10.1021/acs.langmuir.2c02276. Epub 2022 Dec 9.

DOI:10.1021/acs.langmuir.2c02276
PMID:36484233
Abstract

Self-assembled monolayers of corrosion inhibitors of the mercaptobenzimidazole family, SH-BimH, SH-BimH-5NH, and SH-BimH-5OMe, were formed on template-stripped ultraflat Au surfaces using microcontact printing, and subsequently analyzed using X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and AFM-force spectroscopy (AFM-FS) using a quantitative imaging (QI) mode. Printing of all used inhibitor molecules resulted in clear patterns and in slightly more compact films compared to immersion. The stability of the monolayers is further probed by AFM-FS. Adhesion values of laterally heterogeneous inhibitor-modified surfaces compared to bare Au surfaces, nonpatterned areas, and fully covered surfaces are analyzed and discussed. Microcontact printing confers a superior nanomechanical stability to imidazole-modified films of the printed surface patches as compared to homogeneously covered surfaces by immersion into the inhibitor solution.

摘要

自组装单层的腐蚀抑制剂巯基苯并咪唑家族,SH-BimH,SH-BimH-5NH 和 SH-BimH-5OMe,是在模板剥离的超平整金表面上使用微接触印刷形成的,并随后使用 X 射线光电子能谱 (XPS)、原子力显微镜 (AFM) 和原子力显微镜-力谱 (AFM-FS) 进行分析,使用定量成像 (QI) 模式。与浸渍相比,所有使用的抑制剂分子的印刷都产生了清晰的图案和略微更紧凑的薄膜。通过 AFM-FS 进一步探测了单层的稳定性。与裸 Au 表面、非图案区域和完全覆盖的表面相比,对侧向不均匀抑制剂修饰表面的粘附值进行了分析和讨论。与通过浸入抑制剂溶液均匀覆盖的表面相比,微接触印刷赋予了打印表面斑块上的咪唑改性膜优越的纳米机械稳定性。

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