Reynolds David Eun, Lewallen Olivia, Galanis George, Ko Jina
Department of Bioengineering, University of Pennsylvania, Philadelphia, PA 19104, USA.
Department of Biomedical Engineering, Boston University, Boston, MA 02215, USA.
Micromachines (Basel). 2022 Dec 1;13(12):2129. doi: 10.3390/mi13122129.
For microfluidic device fabrication in the research, industry, and commercial areas, the curing and transfer of patterns on photoresist relies on ultraviolet (UV) light. Often, this step is performed by commercial mask aligner or UV lamp exposure systems; however, these machines are often expensive, large, and inaccessible. To find an alternative solution, we present an inexpensive, customizable, and lightweight UV exposure system that is user-friendly and readily available for a homemade cleanroom. We fabricated a portable UV exposure system that costs under $200. The wafer holder's adjustable height enabled for the selection of the appropriate curing distance, demonstrating our system's ability to be easily tailored for different applications. The high light uniformity across a 4" diameter wafer holder (light intensity error ~2.9%) was achieved by adding a light diffusing film to the apparatus. These values are comparable to the light uniformity across a 5" diameter wafer holder from a commercial mask aligner (ABM 3000HR Mask Aligner), that has a light intensity error of ~4.0%. We demonstrated the ability to perform photolithography with high quality by fabricating microfluidic devices and generating uniform microdroplets. We achieved comparable quality to the wafer patterns, microfluidic devices, and droplets made from the ABM 3000HR Mask Aligner.
在研究、工业和商业领域制造微流控设备时，光刻胶上图案的固化和转移依赖于紫外线（UV）光。通常，这一步骤由商用掩膜对准器或紫外线灯曝光系统执行；然而，这些机器往往价格昂贵、体积庞大且难以获得。为了找到替代解决方案，我们展示了一种价格低廉、可定制且轻便的紫外线曝光系统，该系统用户友好，可轻松用于自制洁净室。我们制造了一种成本低于200美元的便携式紫外线曝光系统。晶圆固定器的高度可调，能够选择合适的固化距离，这证明了我们的系统能够轻松针对不同应用进行定制。通过在设备上添加光扩散膜，在直径4英寸的晶圆固定器上实现了高光均匀性（光强误差约2.9%）。这些值与商用掩膜对准器（ABM 3000HR掩膜对准器）直径5英寸的晶圆固定器上的光均匀性相当，该对准器的光强误差约为4.0%。我们通过制造微流控设备和生成均匀的微滴，展示了进行高质量光刻的能力。我们实现了与ABM 3000HR掩膜对准器制造的晶圆图案、微流控设备和液滴相当的质量。
