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用于芯片上器官应用的光印和软光刻技术。

Photo and Soft Lithography for Organ-on-Chip Applications.

机构信息

Department of Electronics, Information and Bioengineering, Politecnico di Milano, Milan, Italy.

Department of Engineering Science, Osney Thermo-Fluids Institute, University of Oxford, Oxford, UK.

出版信息

Methods Mol Biol. 2022;2373:1-19. doi: 10.1007/978-1-0716-1693-2_1.

DOI:10.1007/978-1-0716-1693-2_1
PMID:34520003
Abstract

Organs-on-Chip devices are generally fabricated by means of photo- and soft lithographic techniques. Photolithography is a process that involves the transfer of a pattern onto a substrate by a selective exposure to light. In particular, in this chapter two different photolithography methods will be described: liquid and dry photolithography. In liquid photolithography, a silicon wafer is spin-coated with liquid photoresist and exposed to UV light in order to be patterned. In dry photolithography, the silicon wafer is laminated with resist dry film before being patterned through UV light. In both cases, the UV light can be collimated on top of the wafer either through photomasks or by direct laser exposure. The obtained patterned wafer is then used as a mold for the soft lithographic process (i.e., replica molding) to produce polymer-based microdevices.

摘要

器官芯片设备通常通过光和软光刻技术来制造。光刻是一种通过选择性曝光将图案转移到衬底上的过程。特别是,在本章中,将描述两种不同的光刻方法:液体光刻和干光刻。在液体光刻中,硅片上旋涂液体光刻胶,然后暴露于紫外光下以形成图案。在干光刻中,在硅片上层压抗蚀剂干膜,然后通过紫外光进行图案化。在这两种情况下,紫外光可以通过光刻掩模或直接激光曝光在晶圆顶部准直。然后,将得到的图案化晶圆用作软光刻工艺(即复制模塑)的模具,以生产基于聚合物的微器件。

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