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揭示堆叠石墨烯/六方氮化硼/二硫化钼肖特基异质结对电子能带结构和激子性质的调制作用。

Revealing the Modulation Effects on the Electronic Band Structures and Exciton Properties by Stacking Graphene/h-BN/MoS Schottky Heterostructures.

机构信息

Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Proception, Institute of Optoelectronics, Fudan University, Shanghai200433, China.

State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun130033, China.

出版信息

ACS Appl Mater Interfaces. 2023 Jan 11;15(1):2468-2478. doi: 10.1021/acsami.2c20100. Epub 2022 Dec 30.

Abstract

Stacking two dimensional tunneling heterostructures has always been an important strategy to improve the optoelectronic device performance. However, there are still many disputes about the blocking ability of monolayer (1L-) h-BN on the interlayer coupling. Graphene/h-BN/MoS optoelectronic devices have been reported for superior device results. In this study, starting with graphene/h-BN/MoS heterostructures, we report experimental evidence of 1L-h-BN barrier layer modulation effects about the electronic band structures and exciton properties. We find that 1L-h-BN insertion only partially blocks the interlayer carrier transfer. In the meantime, the 1L-h-BN barrier layer weakens the interlayer coupling effect, by decreasing the efficient dielectric screening and releasing the quantum confinement. Consequently, the optical conductivity and plasmon excitation slightly improve, and the electronic band structures remain unchanged in graphene/h-BN/MoS, explaining their fascinating optoelectronic responses. Moreover, the excitonic binding energies of graphene/h-BN/MoS redshift with respect to the graphene/MoS counterparts. Our results, as well as the broadband optical constants, will help better understand the h-BN barrier layers, facilitating the developing progress of h-BN-based tunneling optoelectronic devices.

摘要

将二维隧道异质结构堆叠一直是提高光电设备性能的重要策略。然而,关于单层(1L-)h-BN 对层间耦合的阻断能力仍存在许多争议。报道了石墨烯/h-BN/MoS 光电设备具有优异的设备性能。在这项研究中,我们从石墨烯/h-BN/MoS 异质结构开始,报告了关于电子能带结构和激子性质的 1L-h-BN 势垒层调制效应的实验证据。我们发现 1L-h-BN 的插入仅部分阻断了层间载流子转移。同时,1L-h-BN 势垒层通过减小有效的介电屏蔽和释放量子限制来减弱层间耦合效应。因此,光学电导率和等离子体激元激发略有改善,并且石墨烯/h-BN/MoS 中的电子能带结构保持不变,解释了它们迷人的光电响应。此外,与石墨烯/MoS 相比,石墨烯/h-BN/MoS 的激子结合能发生红移。我们的结果以及宽带光学常数将有助于更好地理解 h-BN 势垒层,从而促进基于 h-BN 的隧道光电设备的发展。

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