Zhong Aihua, Zhou Yue, Jin Hao, Yu Huimin, Wang Yunkai, Luo Jingting, Huang Longbiao, Sun Zhenhua, Zhang Dongping, Fan Ping
Shenzhen Key Laboratory of Advanced Thin Films and Applications, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, 518060, P.R. China.
Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, 518060, P.R. China.
Small. 2023 Apr;19(14):e2206262. doi: 10.1002/smll.202206262. Epub 2023 Jan 15.
The upsurge of new materials that can be used for near-infrared (NIR) photodetectors operated without cooling is crucial. As a novel material with a small bandgap of ≈0.28 eV, the topological crystalline insulator SnTe has attracted considerable attention. Herein, this work demonstrates self-driven NIR photodetectors based on SnTe/Si and SnTe:Si/Si heterostructures. The SnTe/Si heterostructure has a high detectivity D* of 3.3 × 10 Jones. By Si doping, the SnTe:Si/Si heterostructure reduces the dark current density and increases the photocurrent by ≈1 order of magnitude simultaneously, which improves the detectivity D* by ≈2 orders of magnitude up to 1.59 × 10 Jones. Further theoretical analysis indicates that the improved device performance may be ascribed to the bulk photovoltaic effect (BPVE), in which doped Si atoms break the inversion symmetry and thus enable the generation of additional photocurrents beyond the heterostructure. In addition, the external quantum efficiency (EQE) measured at room temperature at 850 nm increases by a factor of 7.5 times, from 38.5% to 289%. A high responsivity of 1979 mA W without bias and fast rising time of 8 µs are also observed. The significantly improved photodetection achieved by the Si doping is of great interest and may provide a novel strategy for superior photodetectors.
可用于无需冷却即可工作的近红外(NIR)光电探测器的新型材料的兴起至关重要。作为一种带隙约为0.28 eV的新型材料,拓扑晶体绝缘体SnTe引起了广泛关注。在此,这项工作展示了基于SnTe/Si和SnTe:Si/Si异质结构的自驱动近红外光电探测器。SnTe/Si异质结构具有3.3×10琼斯的高探测率D*。通过硅掺杂,SnTe:Si/Si异质结构同时降低了暗电流密度并将光电流提高了约1个数量级,这使得探测率D*提高了约2个数量级,达到1.59×10琼斯。进一步的理论分析表明,器件性能的提高可能归因于体光伏效应(BPVE),其中掺杂的硅原子打破了反演对称性,从而能够在异质结构之外产生额外的光电流。此外,在室温下850 nm处测量的外量子效率(EQE)提高了7.5倍,从38.5%提高到289%。还观察到无偏置时1979 mA W的高响应度和8 µs的快速上升时间。通过硅掺杂实现的显著改进的光电探测具有重要意义,可能为高性能光电探测器提供一种新策略。