State Key Laboratory for Mesoscopic Physics and School of Physics, Peking University , Beijing 100871, China.
Collaborative Innovation Center of Quantum Matter , Beijing 100871, China.
ACS Appl Mater Interfaces. 2017 Feb 15;9(6):5392-5398. doi: 10.1021/acsami.6b14483. Epub 2017 Feb 6.
Graphene and other layered materials, such as transition metal dichalcogenides, have rapidly established themselves as exceptional building blocks for optoelectronic applications because of their unique properties and atomically thin nature. The ability to stack them into van der Waals (vdWs) heterostructures with new functionality has opened a new platform for fundamental research and device applications. Nevertheless, near-infrared (NIR) photodetectors based on layered semiconductors are rarely realized. In this work, we fabricate a graphene-MoTe-graphene vertical vdWs heterostructure on a SiO/p-Si substrate by a facile and reliable site-controllable transfer method and apply it for photodetection from the visible to NIR wavelength range. Compared to the layered semiconductor photodetectors reported thus far, the graphene-MoTe-graphene photodetector has a superior performance, including high photoresponsivity (∼110 mA W at 1064 nm and 205 mA W at 473 nm), high external quantum efficiency (EQE; ∼12.9% at 1064 nm and ∼53.8% at 473 nm), rapid response and recovery processes (a rise time of 24 μs and a fall time of 46 μs under 1064 nm illumination), and free from an external source-drain power supply. We have employed scanning photocurrent microscopy to investigate the photocurrent generation in this heterostructure under various back-gate voltages and found that the two Schottky barriers between the graphenes and MoTe play an important role in the photocurrent generation. In addition, the vdWs heterostructure has a uniform photoresponsive area. The photoresponsivity and EQE of the photodetector can be modulated by the back-gate (p-Si) voltage. We compared the responsivities of thin and thick flakes and found that the responsivity had a strong dependence on the thickness. The heterostructure has promising applications in future novel optoelectronic devices, enabling next-generation high-responsivity, high-speed, flexible, and transparent NIR devices.
石墨烯和其他层状材料,如过渡金属二卤化物,由于其独特的性质和原子级薄的特性,迅速成为光电应用的理想构建模块。将它们堆叠成具有新功能的范德华(vdW)异质结构的能力为基础研究和器件应用开辟了一个新的平台。然而,基于层状半导体的近红外(NIR)光电探测器很少实现。在这项工作中,我们通过一种简单可靠的位控可转移方法,在 SiO/p-Si 衬底上制备了石墨烯-MoTe-石墨烯垂直 vdW 异质结构,并将其应用于从可见光到 NIR 波长范围的光电探测。与迄今为止报道的层状半导体光电探测器相比,石墨烯-MoTe-石墨烯光电探测器具有卓越的性能,包括高光响应率(在 1064nm 时约为 110mA W,在 473nm 时约为 205mA W)、高光外量子效率(在 1064nm 时约为 12.9%,在 473nm 时约为 53.8%)、快速的响应和恢复过程(在 1064nm 光照下,上升时间为 24μs,下降时间为 46μs),并且无需外部源-漏电源。我们采用扫描光电流显微镜研究了在不同背栅电压下该异质结构中的光电流产生情况,发现石墨烯和 MoTe 之间的两个肖特基势垒在光电流产生中起着重要作用。此外,vdW 异质结构具有均匀的光响应面积。光电探测器的光响应率和外量子效率可以通过背栅(p-Si)电压进行调制。我们比较了薄和厚的薄片的响应率,发现响应率强烈依赖于厚度。该异质结构在未来新型光电器件中有应用前景,可实现下一代高响应率、高速、灵活和透明的 NIR 器件。