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关注快中子辐照的硅基和磷化铟基雪崩光电二极管的雪崩击穿特性。

Focus on the Avalanche Breakdown Characteristic of Si- and InP-Based APDs Irradiated by Fast Neutrons.

作者信息

Kang Jianbin, Li Qian, Fu Xiang, Chen Feiliang, Li Mo

机构信息

Microsystem and Terahertz Research Center of Institute of Electronic Engineering, China Academy of Engineering Physics, Chengdu 610200, China.

Key Laboratory of Optoelectronic Technology and Systems, Ministry of Education, Chongqing University, Chongqing 400044, China.

出版信息

Micromachines (Basel). 2022 Dec 29;14(1):86. doi: 10.3390/mi14010086.

Abstract

The Si- and InP-based APDs as the most important weak light semiconductor photodetectors to have achieved commercial success and are widely used in irradiation environments. Investigating the influencing mechanism of neutron irradiation on the above two types of APDs is of scientific and practical importance. In this paper, the dark current and gain characteristics of Si- and InP-based APDs around breakdown voltage were analyzed in detail before and after irradiation. The increase of dark current and the decrease of gain were observed for both the neutron irradiated Si- and InP-based APDs. Generation centers induced by neutrons are responsible for the increased dark current. The decrease of gain can be attributed to the increase of multiplied dark current and the change of electric field distribution in APD. The Si-based APD exhibits soft breakdown with the breakdown voltage reduced by ~8 V under the neutron fluence of 1.0 × 10 cm, while the soft breakdown occurs along with a small change of breakdown voltage of ~1.5 V under the neutron fluence of 1.0 × 10 cm for InP-based APD. The difference in the change of breakdown voltage probably occurs because the Si-based APD uses p-doped Si as the multiplication layer, in which the neutron induced carrier removing effect cannot be ignored to keep the electric field distribution away from the optimal state. Therefore, using an intrinsic multiplication layer in APD is helpful to improve the neutron radiation resistance. The findings here are not only useful for the radiation hardened design of APD, but also deepen the understanding of irradiation mechanism.

摘要

基于硅和磷化铟的雪崩光电二极管(APD)作为最重要的弱光半导体光电探测器已取得商业成功,并广泛应用于辐照环境。研究中子辐照对上述两种类型APD的影响机制具有科学和实际意义。本文详细分析了基于硅和磷化铟的APD在辐照前后击穿电压附近的暗电流和增益特性。观察到中子辐照后的硅基和磷化铟基APD的暗电流均增加,增益均降低。中子诱导的产生中心是暗电流增加的原因。增益降低可归因于倍增暗电流的增加和APD中电场分布的变化。硅基APD在1.0×10¹⁴ cm⁻²的中子注量下表现出软击穿,击穿电压降低约8 V,而磷化铟基APD在1.0×10¹⁵ cm⁻²的中子注量下软击穿伴随着约1.5 V的击穿电压小变化。击穿电压变化的差异可能是因为硅基APD使用p型掺杂硅作为倍增层,其中中子诱导的载流子去除效应不可忽视,从而使电场分布偏离最佳状态。因此,在APD中使用本征倍增层有助于提高抗中子辐射能力。这里的研究结果不仅对APD的抗辐射加固设计有用,也加深了对辐照机制的理解。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd2e/9863663/30cc846dc752/micromachines-14-00086-g001.jpg

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