Physics Department, Faculty of Science, Beni-Suef University, Beni-Suef 62511, Egypt.
Department of Physics, Faculty of Science, Islamic University of Madinah, Madinah 42351, Saudi Arabia.
Molecules. 2023 Jan 24;28(3):1160. doi: 10.3390/molecules28031160.
TiO thin films were deposited on quartz substrates by metal-organic chemical vapor deposition (MOCVD) at temperatures of 250, 350, and 450 °C. X-ray diffraction (XRD) data revealed the production of a pure anatase phase, a decrease in crystallite size, and a textural change as deposition temperature increased. Atomic force microscopy (AFM) was used to study the morphological properties and confirm XRD results. UV-Vis.-NIR spectroscopy was used to investigate the optical properties of the samples. The effect of deposition temperature on wettability was investigated using contact angle measurements. Sunlight photocatalytic properties increased with the increase in deposition temperature for methyl orange and methylene blue. Films were post-annealed at 500 °C for 2 h. The effect of annealing on all the above-mentioned properties was explored. The kinetic analysis demonstrated superb agreement with the kinetic pseudo-first-order model. The rate of photocatalytic degradation of MB was ~8, 13, and 12 times that of MO using 250, 350, and 450 °C deposited films, respectively. Photodegradation was found to depend on the specific surface area, type of pollutant, and annealing temperature.
通过金属有机化学气相沉积(MOCVD)在 250、350 和 450°C 的温度下将 TiO 薄膜沉积在石英衬底上。X 射线衍射(XRD)数据表明生成了纯锐钛矿相,随着沉积温度的升高,结晶粒度减小,结构发生变化。原子力显微镜(AFM)用于研究形貌特性并确认 XRD 结果。使用紫外-可见-近红外光谱研究样品的光学性质。使用接触角测量研究了润湿性随沉积温度的变化。使用甲基橙和亚甲基蓝研究了沉积温度对光催化性能的影响。将薄膜在 500°C 下退火 2 小时。探索了退火对所有上述性能的影响。动力学分析与动力学拟一级模型非常吻合。使用 250、350 和 450°C 沉积的薄膜,MB 的光催化降解速率分别约为 MO 的 8、13 和 12 倍。光降解取决于比表面积、污染物类型和退火温度。