Hubei Key Lab on Organic and Polymeric Opto-Electronic Materials, TaiKang Center for Life and Medical Sciences, Sauvage Center for Molecular Sciences, Department of Chemistry, Wuhan University, Wuhan, 430072, China.
State Key Laboratory Breeding Base of Basic Science of Stomatology (Hubei-MOST), Key Laboratory of Oral Biomedicine Ministry of Education, School and Hospital of Stomatology, Wuhan University, Wuhan, 430079, P. R. China.
J Mater Chem B. 2023 Jun 21;11(24):5537-5543. doi: 10.1039/d2tb02664c.
The construction of an efficient photothermal antibacterial platform is a promising strategy for the treatment of drug-resistant bacterial infections. Herein, through the introduction of excited-state intramolecular proton transfer to promote the photothermal effect, -(2,4-dihydroxybenzylidene)-4-aminophenol (DOA)-polyvinyl alcohol (PVA) systems (DPVA) can reach 55 °C within 10 s under irradiation. They show superior antibacterial behavior against drug-resistant bacteria and a therapeutic effect on infected skin wounds with only 100 s of irradiation, much faster than those of reported photothermal materials (5-10 min). This work provides a convenient approach to fabricate broad-spectrum antibacterial wound dressings for treating bacteria-infected wounds, greatly contributing to the design and applications of photothermal antibacterial platforms.
构建高效的光热抗菌平台是治疗耐药菌感染的一种很有前途的策略。在此，通过引入激发态分子内质子转移来促进光热效应，-(2,4-二羟基苯亚甲基)-4-氨基酚（DOA）-聚乙烯醇（PVA）体系（DPVA）在照射下 10 秒内可达到 55°C。它们对耐药菌表现出优异的抗菌行为，并且在照射 100 秒后对感染的皮肤伤口具有治疗效果，这比报道的光热材料（5-10 分钟）快得多。这项工作为制备广谱抗菌伤口敷料以治疗细菌感染伤口提供了一种便捷的方法，极大地促进了光热抗菌平台的设计和应用。
