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通过蘸笔纳米光刻技术对亲水性和疏水性金纳米颗粒及磁铁矿纳米颗粒进行图案化处理。

Patterning of Hydrophilic and Hydrophobic Gold and Magnetite Nanoparticles by Dip Pen Nanolithography.

作者信息

Schlichter Lisa, Bosse Florian, Tyler Bonnie J, Arlinghaus Heinrich F, Ravoo Bart Jan

机构信息

Center for Soft Nanoscience and Organic Chemistry Institute, Westfälische Wilhelms- Universität Münster, Busso-Peus-Straße 10, 48149, Münster, Germany.

Center for Soft Nanoscience and Physics Institute, Westfälische Wilhelms-Universität Münster, Busso-Peus-Str. 10, 48149, Münster, Germany.

出版信息

Small. 2023 May;19(18):e2208069. doi: 10.1002/smll.202208069. Epub 2023 Feb 24.

DOI:10.1002/smll.202208069
PMID:36828795
Abstract

Nanoparticles offer unique physical and chemical properties. Dip pen nanolithography of nanoparticles enables versatile patterning and nanofabrication with potential application in electronics and sensing, but is not well studied yet. Herein, the patterned deposition of various nanoparticles onto unmodified silicon substrates is presented. It is shown that aqueous solutions of hydrophilic citrate and cyclodextrin functionalized gold nanoparticles as well as poly(acrylic) acid decorated magnetite nanoparticles are feasible for writing nanostructures. Both smaller and larger nanoparticles can be patterned. Hydrophobic oleylamine or n-dodecylamine capped gold nanoparticles and oleic acid decorated magnetite nanoparticles are deposited from toluene. Tip loading is carried out by dip-coating, and writing succeeds fast within 0.1 s. Also, coating with longer tip dwell times, at different relative humidity and varying frequency are studied for deposition of nanoparticle clusters. The resulting feature size is between 300 and 1780 nm as determined by scanning electron microscopy. Atomic force microscopy confirms that the heights of the deposited structures correspond to a single or double layer of nanoparticles. Higher writing speeds lead to smaller line thicknesses, offering possibilities to more complex structures. Dip pen nanolithography can hence be used to pattern nanoparticles on silicon substrates independent of the surface chemistry.

摘要

纳米颗粒具有独特的物理和化学性质。纳米颗粒的蘸笔纳米光刻技术能够实现多功能图案化和纳米制造,在电子学和传感领域具有潜在应用,但目前尚未得到充分研究。在此,展示了将各种纳米颗粒图案化沉积到未改性的硅衬底上的方法。结果表明,亲水性柠檬酸盐和环糊精功能化的金纳米颗粒以及聚丙烯酸修饰的磁铁矿纳米颗粒的水溶液可用于书写纳米结构。较小和较大的纳米颗粒均可进行图案化。疏水性油胺或正十二烷基胺封端的金纳米颗粒以及油酸修饰的磁铁矿纳米颗粒从甲苯中沉积。通过浸涂进行针尖加载,在0.1秒内即可快速完成书写。此外,还研究了在不同相对湿度和不同频率下,通过更长的针尖停留时间进行涂层以沉积纳米颗粒簇。通过扫描电子显微镜测定,所得特征尺寸在300至1780纳米之间。原子力显微镜证实,沉积结构的高度对应于单层或双层纳米颗粒。更高的书写速度会导致线条厚度更小,为制造更复杂的结构提供了可能。因此,蘸笔纳米光刻技术可用于在硅衬底上对纳米颗粒进行图案化,而与表面化学性质无关。

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